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SUBHDIP: process variations tolerant subthreshold Darlington pair-based NBTI sensor circuit

机译:SUBHDIP:基于过程变化的亚阈值达林顿对基于阈值的NBTI传感器电路

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摘要

Aggressive technology scaling has inevitably led to reliability becomes a major concern for modern high-speed and high-performance integrated circuits. The major reliability concerns in nanoscale very-large-scale integration design are the time-dependent negative bias temperature instability (NBTI) degradation. Owing to increasing vertical oxide field and higher operating temperature, the threshold voltage of P-channel MOS transistors increases with time under NBTI. This study presents a novel subthreshold Darlington pair-based NBTI degradation sensor under the stress conditions. The proposed sensor provides the high degree of linearity and sensitivity under subthreshold conditions. The Darlington pair used in the circuit provides the stability and the high-input impedance of the circuit makes it less affected by the process variations. Owing to high sensitivity, the proposed sensor is best suited for sensing of temperature variation, process variation, and temporal degradation during measurement. The sensitivity of the proposed sensor at room temperature is 0.239 mVA under subthreshold conditions. The proposed sensor is less affected by the process variation and has the maximum deviation of 0.0011 mV at standby leakage current of 30 nA.
机译:激进的技术扩展不可避免地导致可靠性成为现代高速和高性能集成电路的主要关注点。纳米级超大规模集成设计中的主要可靠性问题是随时间变化的负偏压温度不稳定性(NBTI)下降。由于垂直氧化物场的增加和较高的工作温度,在NBTI下,P沟道MOS晶体管的阈值电压随时间增加。这项研究提出了一种新的基于阈值达林顿对的基于阈值的NBTI退化传感器。所提出的传感器在亚阈值条件下提供了高度的线性度和灵敏度。电路中使用的达林顿对提供了稳定性,电路的高输入阻抗使其不受工艺变化的影响较小。由于具有高灵敏度,因此所提出的传感器最适合于在测量过程中感测温度变化,过程变化和时间退化。在亚阈值条件下,建议的传感器在室温下的灵敏度为0.239 mV / nA。所提出的传感器受工艺变化的影响较小,并且在待机泄漏电流为30 nA时具有0.0011 mV的最大偏差。

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