Simultaneous etching of underlying metal oxide and sulfide thin films during Cu_2S atomic layer deposition

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• 来源
  《Applied Surface Science》 |2020年第15期|146452.1-146452.7|共7页
• 作者

  Agbenyeke Raphael Edem; Han Seong Ho; Park Bo Keun; Chung Taek-Mo; Lee Young Kuk; Kim Chang Gyoun; Han Jeong Hwan;

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• 作者单位

  Korea Res Inst Chem Technol KRICT Div Adv Mat 141 Gajeong Ro Daejeon South Korea|Univ Sci & Technol UST Dept Chem Convergence Mat 217 Gajeong Ro Daejeon 34113 South Korea;

  Korea Res Inst Chem Technol KRICT Div Adv Mat 141 Gajeong Ro Daejeon South Korea;

  Korea Res Inst Chem Technol KRICT Div Adv Mat 141 Gajeong Ro Daejeon South Korea|Univ Sci & Technol UST Dept Chem Convergence Mat 217 Gajeong Ro Daejeon 34113 South Korea;

  Korea Res Inst Chem Technol KRICT Div Adv Mat 141 Gajeong Ro Daejeon South Korea|Univ Sci & Technol UST Dept Chem Convergence Mat 217 Gajeong Ro Daejeon 34113 South Korea;

  Korea Res Inst Chem Technol KRICT Div Adv Mat 141 Gajeong Ro Daejeon South Korea|Univ Sci & Technol UST Dept Chem Convergence Mat 217 Gajeong Ro Daejeon 34113 South Korea;

  Korea Res Inst Chem Technol KRICT Div Adv Mat 141 Gajeong Ro Daejeon South Korea|Univ Sci & Technol UST Dept Chem Convergence Mat 217 Gajeong Ro Daejeon 34113 South Korea;

  Korea Res Inst Chem Technol KRICT Div Adv Mat 141 Gajeong Ro Daejeon South Korea|Seoul Natl Univ Sci & Technol Dept Mat Sci & Engn Seoul 01811 South Korea;

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• 正文语种 eng
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