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Interaction effects of cathode power, bias voltage, and mid-frequency on the structural and mechanical properties of sputtered amorphous carbon films

机译:阴极功率,偏置电压和中频对溅射非晶碳膜结构和力学性能的相互作用

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The Design of Experiments is a promising method to investigate the cause-effect relation between the mid-frequency magnetron sputtering parameters on the structural and mechanical properties of amorphous carbon (a-C) films. Based on the Central Composite Design, the cathode power of two graphite targets, bias voltage, and mid-frequency were simultaneously varied from 1500 to 4000 W, -100 to - 200 V, and 20 to 50 kHz, respectively. The chemical bonding state was characterized using UV and visible Raman spectroscopy with excitation wavelengths of 266 and 532 nm. Corresponding measurements were performed by X-ray photoelectron spectroscopy (XPS) using synchrotron radiation. Additionally, hardness and elastic modulus of the sputtered a-C films were determined in nanoindentation tests.Multi-wavelength Raman spectroscopy identified an sp(3) content below 20%, with most a-C films having an sp(3) value in the range of 12 to 18%. The formation of sp(3) bonded atoms is negatively influenced by a high cathode power and bias voltage, whereas the highest sp(3) content is obtained with a-C films sputtered with a cathode power and bias voltage of 2750 W and - 150 V. However, higher values of the cathode power and bias voltage result in a film delamination and decrease of the sp(3) concentration. The bonding state affects the mechanical properties, as high hardness and elastic modulus result from a high sp(3) content. Therefore, a targeted adjustment of cathode power and bias voltage is necessary to obtain a-C films with a high hardness. In contrast, the mid-frequency does not have a significant impact on the mechanical properties. In conclusion, the Central Composite Design has proven to be a suitable method to investigate the cause-effects of the sputtering parameters on the properties of the a-C film.
机译:实验设计是研究中频磁控溅射参数与非晶碳(a-C)膜的结构和力学性能之间因果关系的有前途的方法。基于中央复合设计,两个石墨靶材的阴极功率,偏置电压和中频分别从1500W至4000W,-100至-200V和20至50kHz分别变化。使用紫外和可见拉曼光谱法表征化学键合状态,激发波长为266和532 nm。通过使用同步加速器辐射的X射线光电子能谱(XPS)进行相应的测量。此外,在纳米压痕测试中确定了溅射aC膜的硬度和弹性模量。多波长拉曼光谱法确定sp(3)含量低于20%,大多数aC膜的sp(3)值在12至12之间。 18%。 sp(3)键合原子的形成受到高阴极功率和偏置电压的负面影响,而最高的sp(3)含量是通过以2750 W和-150 V的阴极功率和偏置电压溅射的aC膜获得的。但是,较高的阴极功率和偏置电压值会导致薄膜分层并降低sp(3)浓度。粘合状态会影响机械性能,因为高sp(3)含量会导致高硬度和弹性模量。因此,需要有针对性地调节阴极功率和偏置电压以获得具有高硬度的a-C膜。相反,中频对机械性能的影响不大。总之,中央复合设计已被证明是研究溅射参数对a-C膜性能的因果关系的合适方法。

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