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A method for attaching a carbon protection film to a magnetic disk by cathode sputtering superimposed ac voltage with a dc bias

机译:通过阴极溅射在直流偏压下叠加交流电压将碳保护膜附着到磁盘上的方法

摘要

PURPOSE: To prevent the formation of nodules on the surface of a target and to enable the continuous operation of a sputtering device by superimposing AC power on the DC power applied to the target in the meanwhile of the deposition of a carbon film. ;CONSTITUTION: In the meanwhile of the deposition of a carbon film, AC power e.g. 450 KHz, is superimposed on DC power applied to a target of sputtering to almost perfectly eliminate arcing in the process of sputtering and to decrease the formation of nodules. Since the frequency of AC power is generally lower than the frequency of ordinary high-frequency sputtering, a complicated circuit for the matching of impedance is made needless, and the operation and control of the sputtering are made simple.;COPYRIGHT: (C)1994,JPO
机译:目的:通过在沉积碳膜的同时,将交流电叠加在施加于靶材的直流电源上,防止靶材表面形成结节,并使溅射装置能够连续运行。 ;组成:在沉积碳膜的同时,交流电源例如450 KHz叠加在施加到溅射靶材的直流电源上,以几乎完美地消除溅射过程中的电弧并减少结瘤的形成。由于交流电源的频率通常低于普通的高频溅射的频率,因此不需要复杂的阻抗匹配电路,并且溅射的操作和控制也变得简单。;版权所有:(C)1994 ,日本特许厅

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