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Structural And Optical Properties Of Pulsed Laser Deposited srbi_2nb_2o_9 Thin Films

机译:脉冲激光沉积srbi_2nb_2o_9薄膜的结构和光学性质

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SrBi_2Nb_2O_9 (SBN) thin films were prepared on fused quartz substrates at room temperature by pulsed laser deposition. The influence of deposition parameters such as target-to-substrate distance, oxygen pressure and annealing temperature on film crystallization behavior was investigated by X-ray diffraction. Results indicated that the films grown at the optimum processing conditions have polycrystalline structure with a single layered perovskite phase. The optical transmittance of the films prepared at various oxygen pressures was measured in the wavelength range 200-900 nm using UV-vis spectrophotometer. The results showed that there is a red shift in the optical absorption edge with a rise in the oxygen pressure. Refractive index as a function of wavelength and optical band gap of the films were determined from the optical transmittance spectra. The results indicated that the refractive index increases with increasing oxygen pressure at the same incident light wavelength, while the band gap reduces from 4.13 to 3.88 eV. It may be attributed to an increase in packing density and grain size, and decrease in oxygen defects.
机译:通过脉冲激光沉积在室温下在熔融石英衬底上制备SrBi_2Nb_2O_9(SBN)薄膜。通过X射线衍射研究了靶材到衬底的距离,氧气压力和退火温度等沉积参数对薄膜结晶行为的影响。结果表明,在最佳加工条件下生长的薄膜具有多晶结构,具有单层钙钛矿相。使用UV-vis分光光度计在200-900nm的波长范围内测量在各种氧气压力下制备的膜的透光率。结果表明,随着氧气压力的升高,光吸收边缘出现红移。从光学透射光谱确定折射率与膜的波长和光学带隙的关系。结果表明,在相同的入射光波长下,折射率随着氧气压力的增加而增加,而带隙从4.13 eV减小到3.88 eV。这可能归因于堆积密度和晶粒尺寸的增加,以及氧缺陷的减少。

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