首页> 外文期刊>International Journal of Physics >Structural and Optical Properties of PbS Thin Films Deposited by Pulsed Laser Deposited (PLD) Technique at Different Annealing Temperature
【24h】

Structural and Optical Properties of PbS Thin Films Deposited by Pulsed Laser Deposited (PLD) Technique at Different Annealing Temperature

机译:脉冲激光沉积(PLD)技术在不同退火温度下沉积的PbS薄膜的结构和光学性质

获取原文
           

摘要

Lead sulphide (PbS) thin films has attracted interest due to its potential applications in optoelectronics devices, gas sensors, solar cell technology and transparent conducting electrodes. Thin films were grown on glass substrates by pulsed laser deposition (PLD) technique at room temperature and different annealing temperatures (573, 673 and 773) K. The structural measurements for PbS thin film show face-centered-cubic structure. Atomic force microscopy (AFM) was used to examine PbS surface. The films exhibit more homogeneity. The root mean square(r.m.s), surface roughness and average grain size were increased After annealing. The optical properties of PbS thin films are studied as a function to wavelength in region (375 - 1100) nm. The optical transmittance of PbS thin films shown that the transparency decreases with increase of annealing temperature. The direct energy gap for PbS thin film was decreases with increasing of annealing temperature for all sample due to the growth of the crystallites. The optical constants such as refractive index, extinction coefficient and dielectric constant were also calculated.
机译:硫化铅(PbS)薄膜由于其在光电器件,气体传感器,太阳能电池技术和透明导电电极中的潜在应用而备受关注。在室温和不同的退火温度(573、673和773)K下,通过脉冲激光沉积(PLD)技术在玻璃基板上生长薄膜。PbS薄膜的结构测量显示出面心立方结构。原子力显微镜(AFM)用于检查PbS表面。薄膜表现出更高的均匀性。退火后,均方根(r.m.s),表面粗糙度和平均晶粒尺寸均增加。研究了PbS薄膜的光学性质与(375-1100)nm范围内波长的关系。 PbS薄膜的透光率表明,透明性随退火温度的升高而降低。由于微晶的生长,PbS薄膜的直接能隙随所有样品退火温度的升高而减小。还计算了光学常数,例如折射率,消光系数和介电常数。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号