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Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel

机译:占空比对在线脉冲直流磁控溅射法在电阻式触摸屏上沉积铟锡氧化物(ITO)膜的影响

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摘要

The indium tin oxide (ITO) film was deposited on PET (polyethylene terephthalate) film using in-line pulsed DC magnetron sputtering system with different duty ratios. The reverse time and the frequency of pulsed DC power were changed to obtain the different duty ratios. From the electrical and optical properties such as the sheet resistance, resistivity, thickness and transmittance, the pulsed DC sputtered ITO/PET films were also superior to the DC sputtered ITO/PET films. The reverse time had little effect on the properties of the ITO/PET film and the frequency of pulsed DC power had an immerse effect on the properties of the ITO/PET films. The optimal ITO/PET film was obtained when the frequency was 200 kHz, the reverse time was 1 μs. and the duty ratio was about 80%.
机译:使用在线式脉冲直流磁控溅射系统以不同的占空比将氧化铟锡(ITO)膜沉积在PET(聚对苯二甲酸乙二酯)膜上。改变反向时间和脉冲直流电源的频率以获得不同的占空比。从诸如薄层电阻,电阻率,厚度和透射率的电学和光学特性来看,脉冲直流溅射ITO / PET膜也优于直流溅射ITO / PET膜。反向时间对ITO / PET薄膜的性能影响很小,而脉冲直流电源的频率对ITO / PET薄膜的性能则有沉浸效果。当频率为200 kHz,反向时间为1μs时,可获得最佳的ITO / PET膜。占空比约为80%。

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  • 来源
    《Applied Surface Science》 |2011年第3期|p.1242-1248|共7页
  • 作者单位

    Department of Electronics Engineering, Kyungwon University, San 65, Bokjung-dong, Soojung-gu, Seongnam City, Kyunggi-do 461-701, South Korea;

    Department of Electronics Engineering, Kyungwon University, San 65, Bokjung-dong, Soojung-gu, Seongnam City, Kyunggi-do 461-701, South Korea;

    Department of Electronics Engineering, Kyungwon University, San 65, Bokjung-dong, Soojung-gu, Seongnam City, Kyunggi-do 461-701, South Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    reverse time; frequency; pulsed dc sputtering; indium tin oxide (ITO); duty ratio;

    机译:倒转时间;频率;脉冲直流溅射氧化铟锡(ITO);占空比;

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