机译:磁控共溅射制备非化学计量的a-Ge_(1-x)C_x薄膜的光学和电学性质
Center for Composite Materials, Harbin Institute ofTechnology, P.O. Box 3010, Yikuang Street 2, Harbin 150080, PR China;
Center for Composite Materials, Harbin Institute ofTechnology, P.O. Box 3010, Yikuang Street 2, Harbin 150080, PR China;
Center for Composite Materials, Harbin Institute ofTechnology, P.O. Box 3010, Yikuang Street 2, Harbin 150080, PR China;
Center for Composite Materials, Harbin Institute ofTechnology, P.O. Box 3010, Yikuang Street 2, Harbin 150080, PR China;
Center for Composite Materials, Harbin Institute ofTechnology, P.O. Box 3010, Yikuang Street 2, Harbin 150080, PR China;
Center for Composite Materials, Harbin Institute ofTechnology, P.O. Box 3010, Yikuang Street 2, Harbin 150080, PR China;
School of Materials Science and Engineering, Harbin Institute ofTechnology, West Da-Zhi Street 92, Harbin 150001, PR China;
magnetron co-sputtering; germanium carbide; chemical bonding; optical properties; electrical properties;
机译:d.c的富硅a-Si_(1-x)C_x薄膜磁控溅射硅和碳化硅的共溅射:结构和光学性质
机译:磁控共溅射Ge_(1-X)C_x薄膜的表面形貌,结构和力学性能
机译:通过射频磁控旋转系统制备的Al掺杂ZnO透明导电膜的电气和光学性质
机译:双靶磁控共溅射制备a-InGaAs:H薄膜的光电性能
机译:通过大功率脉冲磁控溅射沉积的银膜的电学和光学性质。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:BA x sub> sr 1-x / sub> tio 3 sub>薄膜通过突出温度和化学计量效果