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Surface morphology and ferroelectric properties of compositional gradient PZT thin films prepared by chemical solution deposition process

机译:化学溶液沉积法制备组成梯度PZT薄膜的表面形貌和铁电性能

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摘要

A series of PbTiO_3/PbZr_xTi_(1-x)O3 (PT/PZT) and PbZrO_3/PbZr_xTi_(1-x)O_3 (PZ/PZT) compositional gradient thin films are obtained by chemical solution decomposition (CSD) method. The influences of buffer layers on surface morphology are investigated. Thin films with buffer layer are able to maintain the perovskite structure with (111)-preferred orientation. The surface microstructure and ferroelectric properties of the PZT thin films differs significantly depending on the use of PT or PZ buffer layers. When the PT buffer layer has five layers, the root mean square roughness (RMS) [17.7nm] and remnant polarization (P_r) [35.83 μC/cm~2 ] are maximized. On the other hand, when PZ buffer layer has one layer, the RMS [3.67 nm] and P_r [26.08 μC/cm~2] are also maximized. The down-graded (Zr composition varying from 0.6 at the bottom surface to 0.4 at top surface) thin films exhibit larger surface roughness and better ferroelectric property than up-graded (Zr composition varying from 0.4 at the bottom surface to 0.6 at top surface) thin films. Therefore, different buffer layer determines different surface morphology. It is concluded that the ferroelectric property of the gradient thin films not only depends on its composition structure, but can also be controlled by the surface morphology. The results indicate that the PZT films with better ferroelectric property should have larger surface roughness.
机译:通过化学溶液分解(CSD)法获得了一系列的PbTiO_3 / PbZr_xTi_(1-x)O3(PT / PZT)和PbZrO_3 / PbZr_xTi_(1-x)O_3(PZ / PZT)组成梯度薄膜。研究了缓冲层对表面形貌的影响。具有缓冲层的薄膜能够保持钙钛矿结构具有(111)优先取向。根据PT或PZ缓冲层的使用,PZT薄膜的表面微观结构和铁电性能差异很大。当PT缓冲层具有五层时,均方根粗糙度(RMS)[17.7nm]和残余极化(P_r)[35.83μC/ cm〜2]最大化。另一方面,当PZ缓冲层具有一层时,RMS [3.67nm]和P_r [26.08μC/ cm〜2]也最大化。降级(Zr组成从底表面的0.6到顶表面的0.4改变)薄膜显示出比向上渐变(Zr组成从底表面的0.4到顶表面的0.6改变)更大的表面粗糙度和更好的铁电性能。薄膜。因此,不同的缓冲层决定了不同的表面形态。结论是,梯度薄膜的铁电性能不仅取决于其组成结构,而且还可以通过表面形态来控制。结果表明,具有较好铁电性能的PZT薄膜应具有较大的表面粗糙度。

著录项

  • 来源
    《Applied Surface Science》 |2013年第15期|532-536|共5页
  • 作者单位

    Faculty of Materials Science and Chemical Engineering, China University of Geosciences, Wuhan City 430074, PR China;

    Faculty of Materials Science and Chemical Engineering, China University of Geosciences, Wuhan City 430074, PR China;

    Faculty of Materials Science and Chemical Engineering, China University of Geosciences, Wuhan City 430074, PR China;

    Faculty of Materials Science and Chemical Engineering, China University of Geosciences, Wuhan City 430074, PR China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Compositional gradient PZT thin films; Buffer layer; Surface morphology; Ferroelectric properties;

    机译:成分梯度PZT薄膜;缓冲层;表面形态铁电性能;

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