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Heterostructure and compositional depth profile of low-temperature processed lead titanate-based ferroelectric thin films prepared by photochemical solution deposition

机译:光化学溶液沉积制备的低温处理钛酸铅基铁电薄膜的异质结构和组成深度分布

摘要

The heterostructure and compositional depth profile of low-temperature processed (Pb0.76Ca0.24)TiO3 (PCT24) ferroelectric thin films have been studied in the present work. The films were prepared by ultraviolet (UV) sol-gel photoannealing (also called photochemical solution deposition, PCSD) onto platinized silicon substrates and crystallized at 450 °C in air and oxygen atmospheres. Despite using such a low temperature, analysis carried out by X-ray photoelectron spectroscopy (XPS) revealed the total lack of organic rests within the bulk film. Complementary information about the heterostructure of the films was also obtained by Rutherford backscattering spectroscopy (RBS). Both analytical techniques detected the presence of a lead gradient in the films, together with small fluctuations on the concentration of this element along the bulk film. The RBS study also showed that the films of this work develop a PtxPb interface between the ferroelectric layer and the Pt bottom electrode. The thickness of this interlayer is much lower than that of the interface formed in PCT24 films prepared at higher temperatures (650 °C) without UV irradiation (conventional CSD). On the other hand, the low processing temperature here used minimizes the lead loss by volatilization, as deduced from the RBS simulated spectra of the films. Thus, the lead excess incorporated in the precursor solution remains in the films after the crystallization treatment. This result would suppose a significant advance toward the environmentally low-impact processing of lead-containing ferroelectric films with applications in electrical and electronic components (e.g., piezoelectric devices). © 2008 American Chemical Society.
机译:在本工作中,已经研究了低温处理的(Pb0.76Ca0.24)TiO3(PCT24)铁电薄膜的异质结构和组成深度分布。薄膜是通过紫外(UV)溶胶-凝胶光退火(也称为光化学溶液沉积,PCSD)在镀铂的硅基板上制备的,并在空气和氧气气氛中于450°C结晶。尽管使用了如此低的温度,但通过X射线光电子能谱(XPS)进行的分析显示,整体薄膜中完全没有有机残留物。关于薄膜异质结构的补充信息也可以通过卢瑟福背散射光谱法(RBS)获得。两种分析技术都检测到薄膜中存在铅梯度,以及沿块状薄膜中该元素浓度的微小波动。 RBS研究还表明,这项工作的薄膜在铁电层和Pt底部电极之间形成了PtxPb界面。该中间层的厚度远小于在没有紫外线照射(常规CSD)的较高温度(650℃)下制备的PCT24薄膜中形成的界面的厚度。另一方面,根据薄膜的RBS模拟光谱推导,此处使用的低处理温度可最大程度地减少挥发引起的铅损失。因此,在结晶处理之后,结合在前体溶液中的过量的铅保留在膜中。该结果将假定在含铅的铁电薄膜的环境低冲击处理方面取得了重大进展,并将其应用于电气和电子部件(例如,压电器件)中。 ©2008美国化学学会。

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