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Pulsed laser deposition of relaxor ferroelectric lead magnesium niobate-lead titanate thin films and heterostructures.

机译:弛豫铁电体铌酸镁铅-钛酸铅薄膜和异质结构的脉冲激光沉积。

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摘要

Since their discovery several decades ago, relaxor ferroelectrics (RFE) (1-x)Pb(Mg1/3Nb2/3)O3-xPbTiO3 (PMN-PT), engineered near the morphotropic phase boundary (x = 0.3), have raised tremendous interest in the ferroelectric community, due to their broad ferroelectric transition, enormous dielectric constant, high piezoelectric coefficients and exceptional electromechanical coupling factors. However, these attractive qualities were demonstrated mainly by PMN-PT single crystals and ceramics and scarcely at all by PMN-PT thin films. This thesis addresses critical issues of the pulsed laser deposition growth of high quality epitaxial 0.70PMN-0.30PT thin films and heterostructures, for potential ferroelectric and piezoelectric thin film applications.; A review of relaxor ferroelectrics in terms of general characteristics, crystallographic structure, models and synthesis with a special emphasis on 0.70PMN-0.30PT solid solutions is presented, including current issues of the Pulsed Laser Deposition (PLD) method, highlighting particular problems of lead-compound synthesis.; The development of two pulsed laser deposition systems, two six target carousels, a target motion amplifier, an inverse position arm sputtering system, one He-Ne laser alignment system and one shadow mask set are described. These systems have been used for the growth of epitaxial RFE PMN-PT thin films and heterostructures.; The main issues regarding the growth of pure perovskite phase single crystal PMN-PT/(001)SrTiO3 thin films and PMN-PT/SrRuO3/(001)SrTiO 3 heterostructures by PLD, the optimized deposition parameter space for in-situ growth, and the structural and chemical characterization of high quality PMN-PT thin films and heterostructures are addressed. Epitaxial PMN-PT thin films and heterostructures of unprecedented quality, resembling that of bulk single crystals are reported, and the thickness dependences of the strain state and crystalline quality are established. A film-growth, self-regulatory mechanism was found to adjust the non-stoichiometric atomic flux coming from the off-stoichiometric PMN-PT targets to form the perovskite phase when lower deposition rates were used. Laser instabilities and their impact upon the films reproducibility are discussed.; Dielectric and piezoelectric measurements performed on PMN-PT thin films, together with the factors that influence these measurements, are presented. The thickness dependences of dielectric and ferroelectric parameters is reported. Annealing treatments in high oxygen pressure are shown to improve film dielectric and ferroelectric properties. Thicker films demonstrate the highest room temperature dielectric constants (ϵ = 12000) and ferroelectric properties (remnant polarization Pr = 20 μC/cm2, coercive field EC = 10 KV/cm, saturation polarization PS = 38 μC/cm2, saturation field ES = 30 KV/cm) ever reported for a PMN-PT film, regardless of the deposition method involved. The piezoelectric charge coefficient at high fields is found to be d33 = 30 pm/V.
机译:自几十年前被发现以来,弛豫铁电体(RFE)(1-x)Pb(Mg 1/3 Nb 2/3 )O 3 -xPbTiO 3 (PMN-PT),在同相相界(x = 0.3)附近进行工程设计,由于其宽的铁电跃迁,巨大的介电常数,高的介电常数引起了人们的极大兴趣。压电系数和出色的机电耦合系数。但是,这些吸引人的品质主要由PMN-PT单晶和陶瓷证明,而几乎没有由PMN-PT薄膜证明。本论文解决了潜在的铁电和压电薄膜应用中高质量外延0.70PMN-0.30PT薄膜和异质结构的脉冲激光沉积生长的关键问题。本文介绍了弛豫铁电体的一般特性,晶体结构,模型和合成,特别强调了0.70PMN-0.30PT固溶体,包括脉冲激光沉积(PLD)方法的当前问题,重点介绍了铅的特殊问题。 -化合物合成。描述了两个脉冲激光沉积系统,两个六个目标转盘,一个目标运动放大器,一个反向位置臂溅射系统,一个He-Ne激光对准系统和一个荫罩组的开发。这些系统已用于外延RFE PMN-PT薄膜和异质结构的生长。纯钙钛矿相单晶PMN-PT /(001)SrTiO 3 薄膜和PMN-PT / SrRuO 3 /(001)SrTiO <讨论了PLD的sub> 3 异质结构,原位生长的优化沉积参数空间,以及高质量PMN-PT薄膜和异质结构的结构和化学表征。据报道外延PMN-PT薄膜和异质结构具有前所未有的质量,类似于块状单晶,并建立了应变状态和晶体质量的厚度依赖性。当使用较低的沉积速率时,发现膜生长的自我调节机制可以调节来自非化学计量的PMN-PT靶的非化学计量的原子通量,从而形成钙钛矿相。讨论了激光不稳定性及其对胶片再现性的影响。介绍了在PMN-PT薄膜上进行的介电和压电测量,以及影响这些测量的因素。报告了介电和铁电参数的厚度依赖性。高氧气压力下的退火处理显示可以改善薄膜的介电和铁电性能。较厚的薄膜表现出最高的室温介电常数(&epsiv; = 12000)和铁电性能(残余极化Pr = 20μC/ cm 2 ,矫顽场E C = 10 KV / cm,饱和极化P S = 38μC/ cm 2 ,饱和场E S = 30 KV / cm) -PT膜,无论涉及哪种沉积方法。发现高磁场下的压电电荷系数为d 33 = 30 pm / V。

著录项

  • 作者

    Lavric, Dan Silviu.;

  • 作者单位

    Duke University.;

  • 授予单位 Duke University.;
  • 学科 Engineering Materials Science.; Physics Electricity and Magnetism.; Engineering Metallurgy.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 273 p.
  • 总页数 273
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;电磁学、电动力学;冶金工业;
  • 关键词

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