首页> 外国专利> Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material

Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material

机译:可缩放钛酸锆锆(PZT)薄膜材料和沉积方法,以及包括这种薄膜材料的铁电存储器件结构

摘要

A novel lead zirconium titanate (PZT) material having unique properties and application for PZT thin film capacitors and ferroelectric capacitor structures, e.g., FeRAMs, employing such thin film material. The PZT material is scalable, being dimensionally scalable, pulse length scalable and/or E-field scalable in character, and is useful for ferroelectric capacitors over a wide range of thicknesses, e.g., from about 20 nanometers to about 150 nanometers, and a range of lateral dimensions extending to as low as 0.15 μm. Corresponding capacitor areas (i.e., lateral scaling) in a preferred embodiment are in the range of from about 104 to about 10−2 μm2. The scalable PZT material of the invention may be formed by liquid delivery MOCVD, without PZT film modification techniques such as acceptor doping or use of film modifiers (e.g., Nb, Ta, La, Sr, Ca and the like).
机译:具有独特性质的新型钛酸锆钛酸铅(PZT)材料以及用于采用这种薄膜材料的PZT薄膜电容器和铁电电容器结构(例如FeRAM)的应用。 PZT材料具有可伸缩性,尺寸可伸缩性,脉冲长度可伸缩性和/或电场可伸缩性,并且可用于厚度范围很广的铁电电容器,例如,约20纳米至约150纳米,以及横向尺寸扩展至低至0.15μm。在优选实施例中,相应的电容器面积(即,横向缩放)在大约10 4 到大约10 -2 μm 2 的范围内。 。本发明的可缩放PZT材料可以通过液体输送MOCVD形成,而无需PZT膜改性技术,例如受体掺杂或使用膜改性剂(例如,Nb,Ta,La,Sr,Ca等)。

著录项

  • 公开/公告号US8501976B2

    专利类型

  • 公开/公告日2013-08-06

    原文格式PDF

  • 申请/专利权人 THOMAS H. BAUM;

    申请/专利号US20100978393

  • 发明设计人 THOMAS H. BAUM;

    申请日2010-12-23

  • 分类号C07C49/92;

  • 国家 US

  • 入库时间 2022-08-21 16:43:55

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