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Low-Temperature Crystallization of Ferroelectric Lead Zirconium Titanate (PZT) Thin-Films using Solution-Combustion Synthesis Method

机译:铁电铅锆钛酸锆(PZT)薄膜低温结晶使用溶液燃烧合成方法

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Lead Zirconium Titanate (PZT) thin-films have achieved much attention for its superiorpiezoelectric and ferroelectric properties. However, to obtain device-quality PZT thin-films, a highannealing temperature (> 600 ℃), which is incompatible with the standard Si-based CMOS process, isnormally required. Although many studies have been focused on reducing the crystallization temperatureof PZT films to below 450 ℃, such as UV-assisted annealing, microwave-assisted annealing, andmodification of PZT precursor solutions, most of them result in deteriorate film’s quality. In thisstudy, we propose a facile route to realize a low-temperature crystallization (< 450 ℃) of PZT thin-filmsusing a solution-combustion synthesis (SCS) approach, hereafter so-called SCS-PZT.
机译:钛酸铅(PZT)薄膜薄膜造成了很多关注压电和铁电性能。但是,为了获得设备质量的PZT薄膜,高退火温度(> 600℃),与标准的SI基CMOS工艺不相容,是通常需要。虽然许多研究已经集中在降低结晶温度上PZT薄膜低于450℃,如紫外线辅助退火,微波辅助退火,和改性PZT前体溶液,其中大部分导致薄膜质量恶化。在这方面研究,我们提出了一种容易途径来实现PZT薄膜的低温结晶(<450℃)使用溶液燃烧合成(SCS)方法,下文称为SCS-PZT。

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