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Tailoring of optical and wetting properties of sputter deposited silica thin films by glancing angle deposition

机译:通过掠射角沉积来调整溅射沉积二氧化硅薄膜的光学和润湿性能

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摘要

Synthesis of silica thin films by RF magnetron sputtering using glancing angle deposition (GLAD) has been reported here. Films deposited at four different oblique angles (45°, 60°, 75°, 85°) show transition from featureless to columnar structure. The silica films have been characterized for their optical and wetting properties and they exhibit potential for use in applications such as antireflection coatings, self-cleaning coatings, antifogging coatings, etc. The reflectance decreases to a minimum of 3.15% whereas transmittance increases to a maximum of 93.43% when the films have been deposited at an oblique angle of 85°. Water contact angle measurements were done to show the hydrophilic nature of the films. The hydrophilicity of the films gets enhanced and a minimum water contact angle of 20° is achieved with increase in the oblique angle of deposition owing to the increase in the values of roughness.
机译:此处已经报道了使用掠射角沉积(GLAD)的RF磁控溅射合成二氧化硅薄膜的方法。以四个不同的倾斜角(45°,60°,75°,85°)沉积的薄膜显示出从无特征结构到柱状结构的转变。二氧化硅膜的光学和润湿性能得到了表征,它们具有在防反射涂层,自清洁涂层,防雾涂层等应用中的潜力。反射率降低到最小3.15%,透射率增加到最大当以85°的倾斜角沉积膜时,其为93.43%。进行水接触角测量以显示膜的亲水性。由于粗糙度值的增加,膜的亲水性得到增强,并且随着沉积的倾斜角的增加,实现了最小的水接触角为20°。

著录项

  • 来源
    《Applied Surface Science》 |2014年第30期|509-513|共5页
  • 作者单位

    CSIR-Institute of Minerals and Materials Technology, Bhubaneswar 751013, Odisha, India,CSIR-Academy of Scientific and Innovative Research,New Delhi 110001, India;

    CSIR-Institute of Minerals and Materials Technology, Bhubaneswar 751013, Odisha, India,CSIR-Academy of Scientific and Innovative Research,New Delhi 110001, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Silica thin film; Glancing angle deposition; Sputtering;

    机译:二氧化硅薄膜;掠角沉积;溅镀;

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