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首页> 外文期刊>IEEE Transactions on Applied Superconductivity >Preparation of as-grown MgB2 thin films by co-evaporation method at low substrate temperature
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Preparation of as-grown MgB2 thin films by co-evaporation method at low substrate temperature

机译:在低衬底温度下通过共蒸发法制备成膜的MgB2薄膜

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摘要

MgB2 thin film growth on sapphire (0001) and MgO substrates is reported. The thin films were deposited by using the co-evaporation method, in which the deposition rates were well controlled separately. The as-grown thin films demonstrated superconductivity without the use of any post-annealing process. The critical temperature dependence of the substrate temperature and the evaporation rates were investigated, and it was found that a high substrate temperature and high deposition rates are needed to produce high-quality films. Below a substrate temperature of 250°C, the films exhibited no x-ray diffraction peaks, but above it, the films tended to grow epitaxially to c-axis on sapphire (0001) substrate. The critical temperature of MgB2 film was over 30 K, and MgB2 thin films made by co-evaporation method are expected to have excellent properties after further optimization.
机译:据报道,MgB2薄膜在蓝宝石(0001)和MgO衬底上的生长。通过使用共蒸镀法沉积薄膜,其中分别良好地控制沉积速率。所生长的薄膜在不使用任何后退火工艺的情况下表现出超导性。对基板温度和蒸发速率的临界温度依赖性进行了研究,发现生产高质量薄膜需要高基板温度和高沉积速率。在衬底温度为250°C以下时,薄膜没有显示X射线衍射峰,但在衬底温度之上,薄膜倾向于在蓝宝石(0001)衬底上沿c轴外延生长。 MgB2薄膜的临界温度超过30 K,并且通过进一步蒸发后,通过共蒸发法制得的MgB2薄膜有望具有优异的性能。

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