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Use of SrTiO3 as a single buffer layer for RABiTS YBCO coated conductor

机译:SrTiO3用作RABiTS YBCO涂层导体的单个缓冲层

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SrTiO3 (STO) films were epitaxially deposited by PLD on textured Ni-3wt%W (Ni-3W) substrates. The STO film was deposited in two steps-reducing atmosphere first, and then oxidizing atmosphere-to prevent the oxidation of the metal surface from hindering the epitaxial relationship between the film and the substrate. The deposited STO films exhibited sharp biaxial texture and dense surface. YBCO films were epitaxially deposited on STO/Ni-3W and showed Jc(77K, self field)=1.2MA/cm2 and Tc(onset)=88 K. Auger electron spectrometry depth profile analyses show that the STO film can block the diffusion of the metal from the substrate. This work has shown that STO films epitaxially deposited on textured Ni-3W substrate can be used as a single buffer layer of the high current carrying YBCO coated conductor.
机译:通过PLD将SrTiO3(STO)膜外延沉积在织构好的Ni-3wt%W(Ni-3W)衬底上。在两个步骤中先沉积STO膜-首先在还原气氛中,然后在氧化气氛中进行沉积-以防止金属表面的氧化阻碍膜与基材之间的外延关系。沉积的STO膜显示出清晰的双轴织构和致密的表面。 YBCO薄膜外延沉积在STO / Ni-3W上,其Jc(77K,自电场)= 1.2MA / cm2,Tc(起始)= 88K。俄歇电子能谱深度分布分析表明,STO薄膜可以阻止STO / Ni-3W的扩散。基板上的金属。这项工作表明,外延沉积在织构化的Ni-3W衬底上的STO膜可用作高载流YBCO涂层导体的单个缓冲层。

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