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Parametric Testing of HYPRES Superconducting Integrated Circuit Fabrication Processes

机译:HYPRES超导集成电路制造工艺的参数测试

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摘要

A set of diagnostic chips for process control and design parameters evaluation has been developed for HYPRES'' 1.0 ${rm kA/cm}^{2}$ , 4.5 ${rm kA/cm}^{2}$, and 20 ${rm kA/cm}^{2}$ fabrication processes, consisting of four 5 $times$ 5-mm chips. Testing was performed on automated test setup (OCTOPUX) that automatically logs results and maintains records of fabrication process and design parameters. The design of diagnostic structures and automated testing algorithms are discussed. Statistical data are presented on the uniformity and run-to-run variation of the critical currents, critical current density, junction size, inductances, and other fabrication and design parameters collected since September 2005. The influence of the fabrication parameters deviation on operational margins and yield of large superconducting digital integrated circuits is discussed, as well as requirements for the 20 ${rm kA/cm}^{2}$ (80 GHz) process.
机译:已经针对HYPRES''1.0 $ {rm kA / cm} ^ {2} $,4.5 $ {rm kA / cm} ^ {2} $和20 $开发了一套用于过程控制和设计参数评估的诊断芯片{rm kA / cm} ^ {2} $制造工艺,由四个5 x 5毫米的芯片组成。测试是在自动测试设置(OCTOPUX)上执行的,该设置自动记录结果并维护制造过程和设计参数的记录。讨论了诊断结构和自动测试算法的设计。统计数据显示了自2005年9月以来所收集的临界电流,临界电流密度,结尺寸,电感以及其他制造和设计参数的均匀性和运行间变化。制造参数偏差对操作裕度和讨论了大型超导数字集成电路的成品率,以及20 $ {rm kA / cm} ^ {2} $(80 GHz)工艺的要求。

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