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Generation of second harmonic radiation from sub-stoichiometric silicon nitride thin films

机译:亚化学计量的氮化硅薄膜产生二次谐波辐射

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Enhancing second-order optical processes in Si-compatible materials is important for the demonstration of innovative functionalities and nonlinear optical devices integrated on a chip. Here, we demonstrate significantly enhanced Second-Harmonic Generation (SHG) by silicon-rich silicon nitride materials over a broad spectral range, and show a maximum conversion efficiency of 4.5?×?10-6 for sub-stoichiometric samples with 46 at. % silicon. The SHG process in silicon nitride thin films is systematically investigated over a range of material stoichiometry and thermal annealing conditions. These findings can enable the engineering of innovative Si-based devices for nonlinear signal processing and sensing applications on a Si platform.
机译:增强Si兼容材料中的二阶光学过程对于演示创新功能和集成在芯片上的非线性光学器件非常重要。在这里,我们证明了富含硅的氮化硅材料在很宽的光谱范围内显着增强了二次谐波生成(SHG),并且对于次亚谱显示最大转换效率为4.5?×?10 -6 46 at。的化学计量样品%硅。在一系列材料化学计量和热退火条件下,系统地研究了氮化硅薄膜中的SHG工艺。这些发现可以为基于Si平台的非线性信号处理和传感应用的创新的基于Si的设备进行工程设计。

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