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Radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition

机译:金属有机化学气相沉积生长InN薄膜的辐射和非辐射复合过程

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In a recent letter, Intartaglia et al. reported the radiative and nonradiative recombination process in InN films grown by metal organic chemical vapor deposition. The authors studied the photoluminescence (PL) spectra as a function of temperature and time. In their experiments, the luminescence signal of InN was detected by cooled InGaAs photomulti-plier (80 K). It is worthwhile to point out that the typical response cutoff on the long-wavelength side of the InGaAs photomultiplier is around 1700 nm. It is not safe to use an InGaAs photomultiplier to conduct InN PL analysis for the reason that the band-gap energy of InN (~0.7 eV) is just too close to its cutoff edge. By carefully checking the series of PL spectra reported by Intartaglia et al, we found that the PL intensity sharply decreases when the energy approaches 0.76 eV from the peak around 0.77 eV. It is likely that the cutting off of the response of the InGaAs detector in this range contributes to this result.
机译:在最近的一封信中,Intartaglia等人。报道了通过金属有机化学气相沉积生长的InN薄膜的辐射和非辐射复合过程。作者研究了光致发光(PL)光谱与温度和时间的关系。在他们的实验中,通过冷却的InGaAs光电倍增管(80 K)检测到InN的发光信号。值得指出的是,InGaAs光电倍增管的长波长一侧的典型响应截止值为1700 nm左右。使用InGaAs光电倍增管进行InN PL分析是不安全的,原因是InN的带隙能量(〜0.7 eV)太接近其截止边缘。通过仔细检查Intartaglia等人报告的PL光谱序列,我们发现,当能量从0.77 eV附近的峰值接近0.76 eV时,PL强度急剧下降。 InGaAs检测器在此范围内的响应截止很可能有助于此结果。

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