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Radiative and nonradiative recombination processes in InN films grown by metal organic chemical vapor deposition

机译:通过金属有机化学气相沉积法生长的InN薄膜中的辐射和非辐射复合过程

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摘要

The 800 meV photoluminescence band in indium nitride is excited under pulsed excitation conditions and is investigated as a function of temperature and time. Our results are consistent with a composite photoluminescence feature composed of two overlapping bands separated by an ~10 meV splitting, with populations described by a thermal equilibrium model. Efficient nonradiative recombination channels rule both the temperature dependence of the time-integrated photoluminescence spectra and the recombination dynamics. At 10 K, the radiative recombination time is of the order of 300 ns, while the nonradiative recombination time, which is ruled by activation energy of 8 meV, is about 100 ps.
机译:氮化铟中的800 meV光致发光带在脉冲激发条件下被激发,并作为温度和时间的函数进行研究。我们的结果与复合光致发光特征相一致,该特征由两条重叠的带组成,这些重叠的带由〜10 meV分裂分开,其总体由热平衡模型描述。高效的非辐射重组通道既可以控制时间积分光致发光光谱的温度依赖性,也可以控制重组动力学。在10 K时,辐射复合时间约为300 ns,而由8 meV的激活能决定的非辐射复合时间约为100 ps。

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