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High mobility two-dimensional hole system in GaAs/AlGaAs quantum wells grown on (100) GaAs substrates

机译:在(100)GaAs衬底上生长的GaAs / AlGaAs量子阱中的高迁移率二维空穴系统

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We report on the transport properties of a high mobility two-dimensional hole system (2DHS) confined in GaAs/AlGaAs quantum wells grown by molecular-beam epitaxy on the (100) surface of GaAs. The quantum wells are modulation doped with carbon utilizing a resistive filament source. At T=0.3 K and carrier density p=1 X 10~(11) cm~(-2), a mobility of 10~6 cm~2/Vs is achieved. At fixed carrier density p=10~(11) cm~(-2), the mobility is found to be a nonmonotonic function of the quantum well width. The mobility peaks at 10~6 cm~2/Vs for a 15-nm well and is reduced for both smaller and larger well widths for these (100) samples. The mobility anisotropy is found to be small. Mobility along [011] is approximately 20% higher than along the [011] direction. In addition, the low-temperature carrier density is found to have low sensitivity to light. The hole density increases by only ~10% after exposure to red light at T=4.2 K. In structures designed for a lower carrier density of 3.6 X 10~(10) cm~(-2), a mobility of 800 000 cm~2/Vs is achieved at T=15 mK.
机译:我们报告了由GaAs(100)表面上的分子束外延生长的GaAs / AlGaAs量子阱中限制的高迁移率二维空穴系统(2DHS)的传输性质。利用电阻丝源将量子阱调制掺杂有碳。在T = 0.3 K和载流子密度p = 1 X 10〜(11)cm〜(-2)时,迁移率达到10〜6 cm〜2 / Vs。在固定载流子密度p = 10〜(11)cm〜(-2)时,发现迁移率是量子阱宽度的非单调函数。对于15纳米孔,迁移率在10〜6 cm〜2 / Vs处达到峰值,而对于这些(100)样品,较小和较大的阱宽度都减小了迁移率。发现迁移率各向异性小。沿[011]的移动性比沿[011]方向的移动性大约高20%。另外,发现低温载流子密度对光的敏感性低。在T = 4.2 K暴露于红光后,空穴密度仅增加〜10%。在设计用于较低载流子密度3.6 X 10〜(10)cm〜(-2)的结构中,迁移率为800 000 cm〜在T = 15 mK时达到2 / Vs。

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