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Performance improvement in transparent organic thin-film transistors with indium tin oxide/fullerene source/drain contact

机译:具有氧化铟锡/富勒烯源极/漏极触点的透明有机薄膜晶体管的性能提高

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摘要

With the use of fullerene (C_(60)) / indium tin oxide (ITO) source/drain electrode, the performance of a transparent thin-film transistor could be enhanced dramatically. The drain current can be increased by a factor of more than 5. The improvements are attributed to the reduction of the injection barrier at the ITO/pentacene interface, which can be confirmed by the work function measured at the ITO/C_(60) and the contact resistance obtained by transmission line method. Meanwhile, the average transmittance in the visible region with a 3.5 nm C_(60) buffer layer for 65-nm-thick pentacene organic thin film transistors remains at 62.98%.
机译:通过使用富勒烯(C_(60))/氧化铟锡(ITO)源/漏电极,可以大大提高透明薄膜晶体管的性能。漏极电流可以增加5倍以上。这种改进归因于ITO /并五苯界面处注入势垒的减小,这可以通过ITO / C_(60)和通过传输线方法获得的接触电阻。同时,对于65nm厚的并五苯有机薄膜晶体管,在具有3.5nm C_(60)缓冲层的可见区域中的平均透射率保持为62.98%。

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  • 来源
    《Applied Physicsletters》 |2009年第16期|163303.1-163303.3|共3页
  • 作者单位

    Department of Electrical Engineering, Institute of Microelectronics, National Cheng Kung University, Tainan 701, Taiwan;

    Department of Electrical Engineering, Institute of Microelectronics, National Cheng Kung University, Tainan 701, Taiwan;

    Institute of Electro-Optical Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan;

    Institute of Electro-Optical Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan;

    Department of Chemical Engineering, National Cheng Kung University, Tainan 701, Taiwan;

    Department of Photonics, National Sun Yat-sen University, Kaohsiung 804, Taiwan;

    Department of Photonics, National Sun Yat-sen University, Kaohsiung 804, Taiwan;

    Department of Electrical Engineering, Institute of Microelectronics, National Cheng Kung University, Tainan 701, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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