机译:与用作GaN基边缘发射激光器中的光阻挡层的GaN晶格匹配的Al_(0.83)In_(0.17)N
Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Quantum Electronics and Photonics,CH-1015 Lausanne, Switzerland;
Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Quantum Electronics and Photonics,CH-1015 Lausanne, Switzerland;
Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Quantum Electronics and Photonics,CH-1015 Lausanne, Switzerland;
Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Quantum Electronics and Photonics,CH-1015 Lausanne, Switzerland;
Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Quantum Electronics and Photonics,CH-1015 Lausanne, Switzerland;
Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Quantum Electronics and Photonics,CH-1015 Lausanne, Switzerland;
Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Quantum Electronics and Photonics,CH-1015 Lausanne, Switzerland;
机译:包括晶格匹配的Al_(0.83)In_(0.17)N光学阻挡层的GaN基蓝色激光的发射特性,可提高光束质量
机译:包含晶格匹配的Al0.83In0.17N光学阻挡层的GaN基蓝色激光的发射特性,可提高光束质量
机译:蓝色激光二极管,包括晶格匹配的Al_(0.83)In_(0.17)N底部覆盖层
机译:基于GaN的激光二极管,包括晶格匹配的AL_(0.83)IN_(0.17)n包层
机译:光学建模,MOCVD生长和新型制造技术的半极(20-21)GaN倒装芯片边缘发射激光器结构
机译:在几乎晶格匹配的柔性金属箔上制造全色GaN基发光二极管
机译:增强具有双电子阻挡层的蓝色GaN基发光二极管的性能