On the calculation of effective electric field in ln_(0.53)Ga_(0.47)As surface channel metal-oxide-semiconductor field-effect-transistors

摘要

The effective electron mobility of In_(0.53)Ga_(0.47)As metal-oxide-semiconductor field-effect-transistors with HTO_2 gate oxide was measured over a wide range of channel doping concentration. The back bias dependence of effective electron mobility was used to correctly calculate the vertical effective electric field. The effective electron mobility at moderate to high vertical effective electric field shows universal behavior independent of substrate impurity concentration.