High performance solution-deposited amorphous indium gallium zinc oxide thin film transistors by oxygen plasma treatment

摘要

Solution-deposited amorphous indium gallium zinc oxide (a-IGZO) thin film transistors (TFTs) with high performance were fabricated using O_2-plasma treatment of the films prior to high temperature annealing. The O_2-plasma treatment resulted in a decrease in oxygen vacancy and residual hydrocarbon concentration in the a-IGZO films, as well as an improvement in the dielectric/channel interfacial roughness. As a result, the TFTs with O_2-plasma treated a-IGZO channel layers showed three times higher linear field-effect mobility compared to the untreated a-IGZO over a range of processing temperatures. The O_2-plasma treatment effectively reduces the required processing temperature of solution-deposited a-IGZO films to achieve the required performance.