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An innovative band-to-band tunneling analytical model and implications in compact modeling of tunneling-based devices

机译:创新的带间隧道分析模型及其在基于隧道的设备的紧凑建模中的意义

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摘要

In this paper, an analytical band-to-band tunneling model is proposed, validated by means of drift-diffusion simulation and comparison with experimental data, implemented in Verilog-A, and finally proven with SPICE simulator through simulation of circuits featuring tunneling diodes. The p-n junction current calculation starts from a non-local Band-to-Band tunneling theory including the electron-phonon interaction and therefore it is particularly suited for indirect semiconductor materials such as silicon- or germanium-based interband tunneling devices.
机译:本文提出了一种分析性的带间隧穿模型,该模型通过漂移扩散仿真进行了验证,并与实验数据进行了比较,并在Verilog-A中实现,最后通过SPICE仿真器通过模拟具有隧穿二极管的电路进行了验证。 p-n结电流的计算从包含电子-声子相互作用的非局部带间隧穿理论开始,因此特别适用于间接半导体材料,例如基于硅或锗的带间隧穿器件。

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  • 来源
    《Applied Physics Letters》 |2013年第12期|123509.1-123509.5|共5页
  • 作者单位

    Swiss Federal Institute of Technology, EPFL, Lausanne CH-1015, Switzerland,Department of Electrical, Managerial, and Mechanical Engineering, University of Udine, IT-33100 Udine, Italy,IBM Research-Zurich, Rueschlikon CH-8803, Switzerland,Swiss Federal Institute of Technology, ETHZ, Zurich CH-8092, Switzerland;

    Swiss Federal Institute of Technology, EPFL, Lausanne CH-1015, Switzerland;

    Swiss Federal Institute of Technology, EPFL, Lausanne CH-1015, Switzerland;

    Swiss Federal Institute of Technology, EPFL, Lausanne CH-1015, Switzerland;

    Department of Electrical, Managerial, and Mechanical Engineering, University of Udine, IT-33100 Udine, Italy;

    Swiss Federal Institute of Technology, ETHZ, Zurich CH-8092, Switzerland;

    IBM Research-Zurich, Rueschlikon CH-8803, Switzerland;

    Swiss Federal Institute of Technology, EPFL, Lausanne CH-1015, Switzerland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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