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Schottky barrier heights for Au and Pd contacts to MoS_2

机译:Au和Pd接触MoS_2的肖特基势垒高度

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摘要

The search of a p-type metal contact on MoS_2 has remained inconclusive, with high work function metals such as Au, Ni, and Pt showing n-type behavior and mixed reports of n as well as p-type behavior for Pd. In this work, we report quantitative Schottky barrier heights for Au and Pd contacts to MoS_2 obtained by analysing low temperature transistor characteristics and contact resistance data obtained using the transfer length method. Both Au and Pd exhibit n-type behavior on multilayer as well as monolayer MoS_2 transistors with Schottky barrier heights of 0.126 eV and 0.4 eV, and contact resistances of 42 Ω.mm and 18 ×10~4Ω.mm respectively. Scanning photocurrent spectroscopy data is in agreement with the resulting energy band alignment in Au-MoS_2-Pd devices further reinforcing the observation that the Fermi-level is pinned in the upper half of MoS_2 bandgap.
机译:在MoS_2上搜索p型金属接触仍然没有定论,高功函数金属(例如Au,Ni和Pt)显示出n型行为,并且报告了Pd的n和p型行为。在这项工作中,我们通过分析低温晶体管特性和使用转移长度法获得的接触电阻数据,报告了MoS_2的Au和Pd接触的定量肖特基势垒高度。 Au和Pd均在肖特基势垒高度为0.126 eV和0.4 eV的多层和单层MoS_2晶体管上表现出n型行为,接触电阻分别为42Ω.mm和18×10〜4Ω.mm。扫描光电流谱数据与在Au-MoS_2-Pd器件中产生的能带对准一致,进一步加强了费米能级固定在MoS_2带隙上半部分的观察。

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  • 来源
    《Applied Physics Letters》 |2014年第11期|113505.1-113505.4|共4页
  • 作者单位

    Center of Excellence in Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India;

    Center of Excellence in Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India;

    Center of Excellence in Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India;

    Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research,Mumbai 400005, India;

    Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research,Mumbai 400005, India;

    Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research,Mumbai 400005, India;

    Center of Excellence in Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400076, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:59

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