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Schottky barrier heights for Au and Pd contacts to MoS2

机译:Au和Pd接触MoS 2 的肖特基势垒高度

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The search of a p-type metal contact on MoS2 has remained inconclusive, with high work function metals such as Au, Ni, and Pt showing n-type behavior and mixed reports of n as well as p-type behavior for Pd. In this work, we report quantitative Schottky barrier heights for Au and Pd contacts to MoS2 obtained by analysing low temperature transistor characteristics and contact resistance data obtained using the transfer length method. Both Au and Pd exhibit n-type behavior on multilayer as well as monolayer MoS2 transistors with Schottky barrier heights of 0.126 eV and 0.4 eV, and contact resistances of 42 Ω.mm and 18 × 104 Ω.mm respectively. Scanning photocurrent spectroscopy data is in agreement with the resulting energy band alignment in Au-MoS2-Pd devices further reinforcing the observation that the Fermi-level is pinned in the upper half of MoS2 bandgap.
机译:在MoS 2 上搜索p型金属接触仍然没有定论,高功函数金属(例如Au,Ni和Pt)表现出n型行为,并且n和p的混合报告Pd的行为。在这项工作中,我们报告了通过分析低温晶体管特性和使用转移长度法获得的接触电阻数据获得的MoS 2 的Au和Pd接触的定量肖特基势垒高度。 Au和Pd在多层和单层MoS 2 晶体管上均表现出n型行为,肖特基势垒高度分别为0.126 eV和0.4 eV,接触电阻为42Ω.mm和18×10 4 Ω.mm。扫描光电流谱数据与在Au-MoS 2 -Pd器件中产生的能带对准一致,进一步加强了费米能级固定在MoS 2 < / inf>带隙。

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