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Quantum spin Hall insulators in centrosymmetric thin films composed from topologically trivial BiTeI trilayers

机译:由拓扑琐碎的BiTeI三层组成的中心对称薄膜中的量子自旋霍尔绝缘体

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摘要

The quantum spin Hall insulators predicted ten years ago and now experimentally observed are instrumental for a break- through in nanoelectronics due to non-dissipative spin-polarized electron transport through their edges. For this transport to persist at normal conditions, the insulators should possess a sufficiently large band gap in a stable topological phase. Here, we theoretically show that quantum spin Hall insulators can be realized in ultra-thin films constructed from a trivial band insulator with strong spin-orbit coupling. The thinnest film with an inverted gap large enough for practical applications is a centrosymmetric sextuple layer built out of two inversely stacked non-centrosymmetric BiTeI trilayers. This nontrivial sextuple layer turns out to be the structure element of an artificially designed strong three-dimensional topological insulator Bi2Te2I2. We reveal general principles of how a topological insulator can be composed from the structure elements of the BiTeX family (X = I, Br, Cl), which opens new perspectives towards engineering of topological phases.
机译:十年前预测并现在通过实验观察到的量子自旋霍尔绝缘体由于其边缘无耗散的自旋极化电子传输而有助于纳米电子学的突破。为了使这种传输在正常条件下持续进行,绝缘子应在稳定的拓扑阶段具有足够大的带隙。在这里,我们从理论上证明,量子自旋霍尔绝缘子可以在由具有强自旋-轨道耦合的琐碎带状绝缘子构成的超薄膜中实现。具有足够大的倒置间隙以适合实际应用的最薄薄膜是由两个反向堆叠的非中心对称BiTeI三层构成的中心对称六元组层。事实证明,这个非平凡的六元组层是人工设计的强三维拓扑绝缘体Bi2Te2I2的结构元素。我们揭示了如何从BiTeX族的结构元素(X = I,Br,Cl)构成拓扑绝缘体的一般原理,这为拓扑相的工程化开辟了新的前景。

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