基于宏微驱动的光刻机掩模台控制系统设计

摘要

光刻是集成电路制造环节的一项重要工艺,主要通过光刻机来完成.作为其重要组成部分,掩模台的性能直接决定了能生产的芯片制程和效率,其工作特点对掩模台提出各种要求,例如:大行程、高精度等.本文采用了一种宏微结合的控制方案,即宏动部分实现大行程粗定位,微动实现小行程精定位.并利用PID控制算法配合高精度的传感器在实验室实验这套控制方案.文章介绍了系统构成,宏微控制策略,以及各个环节的实现,并分析了最后的实验结果,为今后的掩模台控制系统设计提供参考依据.%Lithography is an important process in produce integrated circuits,mainly through lithography machine to realization.As an important part,reticle stage's performance directly decides the process and production efficiency of chip which can make.Reticle stage'operational features put forward various requirements,such as:long-range;high-precision and so on.This paper proposes a macro-micro control strategy,the macro part achieves long-range but rough position and micro part achieves tiny-range but high-precision.High accuracy sensor and pid control algorithm are used to test this strategy in laboratory.This article introduces system structure,macro-micro control strategy and realization of each part,then analyse experiment result,it can be used as a reference of reticle stage's design in future.