立方氮化硼膜的研究进展与应用（下）

摘要

Cubic Boron Nitride (c-BN)is a type of radiation resistant,corrosion resistant and high temperature resistant wide bandgap (Eg=6.4 eV)multifunctional material with high hardness.Due to its unique properties in machinery,electronics and physicochemis-try aspects,high quality c-BN thin film,thick film and epitaxial growth has been one of the research focuses and difficulties in fields like material science.The recent research progress and application of c-BN film in and outside China has been systematically re-viewed in this article and the basic problems which need to be solved for c-BN film indus-trialization,such as the poor crystallinity,high internal stress and low stability,have been presented.Meanwhile,the research progress of c-BN film in multifunctional applica-tion fields has also been introduced in detail.%立方氮化硼(c-BN)是一种高硬度、耐辐射、耐腐蚀、抗高温的宽禁带(Eg=6.4 eV)多功能材料，因其在机械、电子、物理化学等方面独特的性质，高品质 c-BN 薄膜、厚膜以及外延生长一直是材料科学等领域的研究热点和难点之一。文章对国内外 c-BN 薄膜的最新研究进展及多功能性应用等方面进行了系统的综述，提出了 c-BN 膜工业化亟待解决的基本问题，即结晶度差、内应力高、稳定度低等问题，并且详细介绍了 c-BN 膜在多功能应用领域里的研究进展。