首页> 外文期刊>International Materials Reviews >Review of synthesis and properties of cubic boron nitride (c-BN) thin films
【24h】

Review of synthesis and properties of cubic boron nitride (c-BN) thin films

机译:立方氮化硼(c-BN)薄膜的合成与性能研究进展

获取原文
获取原文并翻译 | 示例
           

摘要

Cubic boron nitride (c-BN) thin films are of significant interest because of their diamond like structure and properties. c-BN shows high thermal conductivity, chemical inertness against ferrous metals even at high temperatures, wide band gap, and good transmittance over a wide spectral range from UV to visible. Applications of c-BN include hard protective coatings for cutting tools, in optical instruments as UV detectors, as emitters, and in high temperature electronic devices. However, synthesis of phase pure c-BN thin films continues to be very challenging. The present study reviews the current status of the synthesis, characterisation, mechanical, electrical, and optical properties of c-BN thin films. Both physical and chemical vapour deposition methods used for the preparation of the c-BN films are covered. In addition, different nucleation and growth models of c-BN formation and growth on different substrates are described. The influence of process parameters such as ion energy, growth temperatures, chemical precursors, bias, and impurities on the nucleation and growth is reviewed. Mechanical properties including hardness, elastic modulus, and stiffness of c-BN films are discussed. The latest developments in electrical properties of the c-BN films based on metal-insulator-semiconductor (MIS) hetero-structures, interface states, impurity states, conduction mechanism, field emission properties, and negative electron affinity (NEA) are presented. The optical properties and cathodoluminescence characteristics of BN films are also discussed.
机译:立方氮化硼(c-BN)薄膜由于其类金刚石结构和性能而引起人们的极大兴趣。 c-BN表现出高的热导率,即使在高温下也对黑色金属具有化学惰性,宽带隙和在从紫外线到可见光的宽光谱范围内具有良好的透射率。 c-BN的应用包括用于切削工具,光学仪器中的紫外线检测器,发射器以及高温电子设备中的硬质保护涂层。然而,相纯c-BN薄膜的合成仍然非常具有挑战性。本研究综述了c-BN薄膜的合成,表征,机械,电学和光学性质的现状。覆盖了用于制备c-BN膜的物理和化学气相沉积方法。另外,描述了不同基底上c-BN形成和生长的不同成核和生长模型。回顾了诸如离子能量,生长温度,化学前体,偏压和杂质等工艺参数对成核和生长的影响。讨论了c-BN薄膜的机械性能,包括硬度,弹性模量和刚度。介绍了基于金属-绝缘体-半导体(MIS)异质结构,界面态,杂质态,导电机制,场发射性质和负电子亲和性(NEA)的c-BN薄膜电学性质的最新进展。还讨论了BN薄膜的光学性质和阴极发光特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号