Photoluminescence Characterization of Boron-doped Si Layers Grown by Molecular Beam Epitaxy

摘要

Photoluminescence spectra were used to characterize the boron-doped Si layers grown by molecular beam epitaxy using HBO2 as the doping source. The influence of boron doping concentration on the dislocation-related photoluminescence spectra of molecular beam epitaxy Si layers annealed at 900℃ was studied with different doping concentrations and growth temperature. The broad photoluminescence band（from 0.75eV to 0.90eV） including D1 and D2 bands was associated with high boron doping concentration in the samples, while D3 and D4 bands might be related to oxygen precipitates.