添加剂元素对AZO薄膜性能的研究进展

摘要

近年来，国内外一些研究者对添加剂元素与铝元素共掺杂的 ZnO 薄膜开展了许多研究并发现在 AZO薄膜掺入添加剂元素不仅会增强AZO薄膜的光电特性，而且还能优化其晶体结构和表面形貌，某些添加剂元素还可以提高AZO薄膜的多项性能和稳定性，这对研究 AZO 薄膜性能的提高提供了一个更具潜力的研究方向。介绍了 AZO 薄膜的基本结构、基本特性以及光电性能原理。对添加剂元素对 AZO薄膜结构的研究和光电性能的研究进行了归纳和总结，并且与 AZO 薄膜进行了对比。综述了添加剂元素掺入的AZO薄膜目前所采用的磁控溅射法、溶胶-凝胶法和脉冲激光法三种主要制备技术以及其优缺点，同时阐述了不同方法掺入添加剂元素的 AZO 薄膜的研究进展。最后介绍了添加剂元素掺入的AZO薄膜在光电领域的应用，展望了其未来发展与研究趋势。%In recent years, some researchers have carried out many studies on Al doped ZnO thin films with additive ele-ments and found that the properties of AZO thin films with additive elements are better than those of AZO thin films .The research achievements mentioned above are summarized and the basic structure and optoelectronic properties of AZO thin films are introduced .The basic structure and optoelectronic properties of AZO thin films with additive elements are de-scribed and compared with those of AZO thin films .The main preparation technology and advancement of additive ele-ments doped AZO thin films are reported and the developments and the research trends of additive elements doped AZO thin films are prospected.The three main technologies of magnetron sputtering, sol AZO film additive elements mixed into the gel and pulsed laser deposition technique and its advantages and disadvantages are summarised , and the research pro-gress of different methods of AZO thin film doped with the elements are expounded .Finally, the authours introduce the ap-plication of AZO thin film doped additive elements in the field of optoelectronics , the prospect of its future development and research trend.