Preparation of patterned SAMs on silicon wafer had a wide range of applications to the microstructure design. In this work, we prepared vinyl terminated self-assembled monolayer on the silicon, which was then employed to prepare different end-surface of single-double self-assembled monolayers by the combination of copper electro-oxidation and mixed solution of potassium permanganate oxidation. The resultant SAMs were characterized within frared spectroscopy (FTIR), contact angle and atomic force microscope (AFM). The FTIR results indicated that the vinyl terminated surface was oxidated to carboxyl terminatedsurface. The contact angle changed from 58. 1 ° to 19. 9 °showed that the membrane was obviously changed to high hydrophilicity. The morphological structures of SAMs was successfully observed with AFM, which displayed the height and phase differences between the films. The study demonstrates that the combination of self-assembly and electro-oxidation can be used to prepare different types of patterned surfaces for micro-nano devices and other research fields in future.%基底上图案化纳米薄膜的制备在微观结构设计领域有广泛应用,在硅基上制备端基为乙烯基的自组装单层膜,利用铜丝电氧化以及高锰酸钾混合溶液氧化,制备不同端基表面的单、双层自组装膜.采用红外光谱(FTIR)、接触角以及原子力显微镜(AFM)对所制备的薄膜进行表征.红外检测结果表明:乙烯基表面经氧化后转变为羧基表面,氧化前后接触角从58.1°转变为19.9°,说明薄膜的亲水性有明显的变化,原子力显微镜扫描得到薄膜的表面形貌,可观察到不同薄膜表面之间的相位及高度变化.结果表明:自组装技术与电氧化法相结合能够有效地制备出不同性质的图案化表面,以用于未来微纳米器件等领域的研究.
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