多孔硅薄膜的微结构及其XRD研究

摘要

使用扫描电子显微镜、原子力显微镜和X射线衍射研究了多孔硅薄膜的微结构. SEM图像显示：多孔硅膜表面的微结构比较均匀；沿纵向方向薄膜内部空腔呈流线型分布；孔和孔之间的间距为10～20 nm. AFM形貌表明：其表面在1×1μm范围内的均方根粗糙度为4.75 nm. XRD结果说明：多孔硅薄膜晶体晶格常数随深度增加而变大，多孔硅薄膜孔壁上Si-H键的比例将减少.%This paper investigates the microstructures and X-ray diffraction (XRD) of nano-porous silicon (PS) thin films by means of scanning electron microscopy (SEM), Atomic Force Microscope (AFM) and X-ray diffraction (XRD). SEM images show the surface microstructures of PS thin films is better uniform. The distribution of the interior cavity along the longitudinal direction of the film is streamlined, and the spacing between the holes being about 10~20 nm. AFM image results show that the RMS (Root Mean Square) roughness is 4.75 nm in its inner surface on the range of 1 × 1μm. XRD r esults indicate:as the depth of PS film with a crystal lattice constant of the film becomes large, the pore walls of PS film of Si-H bond ratio will be reduced.