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An Investigation of Using n-Si Piezoresistive Behavior to Develop a Three-Dimensional Stress Sensing Rosette.

机译:使用n-Si压阻行为开发三维应力传感花环的研究。

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摘要

This work involves the design, microfabrication, calibration, and testing of a new silicon-based piezoresistive rosette capable of extracting the three-dimensional (3D) stresses in the silicon upon deformation. A new 10-element piezoresistive rosette was devised to extract all stress components with temperature compensation compared to the 8-element rosette developed by previous researchers, which delivers partially temperature-compensated stress output. The proposed rosette is made up of either dual- or single-polarity sensing elements through utilizing the unique behavior of the shear piezoresistive coefficient (pi44) in n-Si with impurity concentration. An analytical study was conducted to investigate the feasibility of the new approach. The analysis is based on solving the determinants of the coefficients of the matrices describing the resistance change versus stress and temperature for the sensing elements. The calculated determinants over a range of impurity concentrations showed non-zero regions, thus indicating the feasibility of the approach.;On the other hand, the second prototype, named test chip, using ion implantation doping was used for testing of the rosette after conducting a full calibration process involving uni-axial, thermal, and hydrostatic loads. The testing of the test chip was conducted by applying a four-point bending of a chip-on-beam specimen at room temperature. Three chip orientations and three rosette-sites were used to induce five stress components in a controlled manner, while the out-of-plane normal stress was not tested independently due to its low sensitivity in the current microfabrication run. A finite element model (FEM) of the chip-on-beam loading was developed to compare to the stress output from the experimental testing. The five stress components were extracted from the three rosette-sites and showed good correlation with the FEM.;A full experimental study including the microfabrication, calibration and testing of the 10-element single-polarity rosette was conducted to demonstrate the actual behavior of the rosette in extraction of the 3D stresses. An early prototype, named POC chip, using diffusion doping was used to calibrate the piezoresistive coefficients and temperature coefficient of resistance and calculate the determinants to support the analytical study. The calibration process involved applying uni-axial and thermal loads on the sensing elements. The resulting determinants from the calibration process indicated non-zero values, thus verified the experimental feasibility of the approach.
机译:这项工作涉及一种新的基于硅的压阻花环的设计,微加工,校准和测试,该花环能够在变形时提取硅中的三维(3D)应力。与以前的研究人员开发的可提供部分温度补偿的应力输出的8元素玫瑰花环相比,设计了一种新的10元素压阻玫瑰花环来提取具有温度补偿的所有应力成分。拟议的玫瑰花结通过利用杂质浓度在n-Si中的剪切压阻系数(pi44)的独特行为,由双极性或单极性感测元件组成。进行了分析研究以调查新方法的可行性。该分析基于求解矩阵系数的行列式,该系数描述了感测元件的电阻变化与应力和温度的关系。在一定范围的杂质浓度下计算出的行列式显示出非零区域,从而表明了该方法的可行性。另一方面,第二个原型,称为测试芯片,使用离子注入掺杂法进行了测试后的玫瑰花结。涉及单轴,热和静水载荷的完整校准过程。通过在室温下对梁上芯片样品进行四点弯曲来进行测试芯片的测试。三个芯片方向和三个玫瑰花结位点用于以受控方式诱发五个应力分量,而平面外法向应力由于当前微加工中的低灵敏度而没有独立测试。开发了梁上芯片加载的有限元模型(FEM),以与实验测试的应力输出进行比较。从三个玫瑰花结部位提取了五个应力成分,并显示出与FEM的良好相关性;进行了包括10个元素的单极性玫瑰花结的微细加工,标定和测试在内的完整实验研究,以证明其实际行为。提取3D应力的花环。使用扩散掺杂的早期原型POC芯片用于校准电阻的压阻系数和温度系数,并计算决定因素以支持分析研究。校准过程涉及在传感元件上施加单轴和热负荷。校准过程中得出的决定因素表明非零值,从而验证了该方法的实验可行性。

著录项

  • 作者单位

    University of Alberta (Canada).;

  • 授予单位 University of Alberta (Canada).;
  • 学科 Engineering Mechanical.;Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2013
  • 页码 258 p.
  • 总页数 258
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 老年病学;
  • 关键词

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