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Towards High Quality and Large Area Two Dimensional Layered Materials: Synthesis, Transfer and Electronic Properties.

机译:迈向高质量和大面积二维分层材料:合成,转移和电子性能。

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摘要

In 2004,a new era of two-dimensional (2D) layered materials in the material science and nanoelectronics was heralded. These new materials such as graphene and h-BN, consisting of planar sheets of sp2 bonded atoms arranged in a honeycomb crystal lattice, have drawn intense attention due to their exceptional properties. Despite intense interest and remarkably rapid progress in the field of 2D material-related research, there still exists a long way ahead for the widespread use of these 2D materials in the electronics/optoelectronics community. It primarily results from the difficulty in reliably producing high quality samples, especially in a scalable fashion. In this thesis, high-quality, large-area 2D materials have been successfully synthesized by utilizing our home-built cold/hot wall reactors, and transferred onto both conventional and modified SiO2/Si substrates for comprehensive characterization.;Firstly, in graphene growth, recent studies show that at the initial stage of chemical vapor deposition (CVD), the isolated carbon monomers form defective carbon clusters with pentagons that inevitably degrade the quality of synthesized graphene. To circumvent this hurdle, we demonstrate that high-quality centimeter-sized graphene sheets can be synthesized on Cu foils by a self-assembled approach with defect-free polycyclic aromatic hydrocarbons (PAHs) in a high vacuum (HV) chamber (cold wall reactor) without hydrogen. Different molecular motifs, namely coronene, pentacene, and rubrene, can lead to significant difference in the quality of synthesized graphene. When coronene used as precursor, monolayer graphene flakes with an adequate quality can be achieved at a growth temperature as low as 550°C. For the graphene sheets obtained at 1000°C, a carrier mobility up to ∼5300 cm2/V˙s on bare SiO2/Si at room temperature has been attained through transport measurements performed on back-gated field effect transistors (FETs) composed of large channel lengths (∼30 microm). The underlying growth mechanism mainly involves surface-mediated nucleation process of dehydrogenated PAHs rather than segregation or precipitation process of small carbon species decomposed from the precursors.;Secondly, based on our proposed growth mechanism, high quality graphene sheets have been obtained from another PAH, namely triphenylene. Due to the low melting point of triphenylene, nickel foils fastened by a magnet outside of the growth chamber were used as thermal shield to avoid any unwanted sublimation of triphenylene. Moreover, during the transfer process, Poly(Bisphenol A carbonate) was selected as the supporting layer instead of commonly used poly (methyl methacrylate, PMMA) to attain the clean graphene surface on a large scale.;Thirdly, for the best-quality graphene sheets derived from coronene precursor, it is found that an OTMS-SAM modified SiO2/Si substrate can consistently enhance the performance of large-area graphene FETs. The improved transport properties in terms of boosted carrier mobility (up to 10,700 +/- 300 cm2/V˙s), long mean free path of carriers, nearly vanished hysteretic behavior, and remarkably low intrinsic doping level are mainly attributed to the strong suppression of interfacial charge impurity scattering and remote interfacial phonon (RIP) scattering, less adsorption of dipolar adsorbates, and the attenuated charger transfer at the interface of graphene and dielectric. The intrinsic doping levels (the Fermi energy) of graphene on OTMS-modified and bare SiO2/Si have been quantitatively estimated and corroborated by the Dirac point location of GFETs, the Raman spectroscopic mapping of G-peak position, and the surface potential distribution by Kelvin probe force microscopy (KPFM).;Finally, we have presented the LPCVD synthesis (hot wall reactor) to obtain both monolayer and multilayer h-BN ultrathin films by using copper-foil enclosure and Cu tube, respectively. Unlike the hexagonal shape of graphene nucleation islands, h-BN starts to grow with a triangular shape/asymmetric diamond, possibly due to the more energetically favored nitrogen-atom-terminated edges. With prolonged growth time, the h-BN nuclei/islands extend in plane and merge with each other, resulting in a complete layer covering the Cu surface. Multilayer h-BN ultrathin films in large area (∼cm2) have been successfully transferred on SiO2/Si substrate and characterized by XPS, Raman spectroscopy, and AFM. With the synthesized h-BN ultrathin films, one can envisage many interesting research aspects, which will definitely bring about important applications, e.g., UV light emitting thin films for optoelectronics applications, and gate dielectric layers/substrates for graphene electronics applications.
机译:2004年,材料科学和纳米电子学中二维(2D)层状材料的新纪元宣告来临。这些新材料(例如石墨烯和h-BN)由排列成蜂窝晶格的sp2键合原子的平面薄片组成,由于其卓越的性能而受到了广泛的关注。尽管在2D材料相关的研究领域中引起了极大的兴趣并取得了显着的进步,但在电子/光电子领域中广泛使用这些2D材料仍存在很长的路要走。这主要是由于难以可靠地生产出高质量的样品,尤其是以可扩展的方式。本文利用自制的冷/热壁反应器成功地合成了高质量,大面积的二维材料,并将其转移到常规和改性的SiO2 / Si衬底上进行全面表征。最近的研究表明,在化学气相沉积(CVD)的初始阶段,分离出的碳单体会与五边形形成有缺陷的碳簇,从而不可避免地降低合成石​​墨烯的质量。为了克服这一障碍,我们证明了可以在高真空(HV)室(冷壁反应器)中通过无缺陷多环芳烃(PAH)的自组装方法在铜箔上合成高质量厘米级的石墨烯片)不含氢。不同的分子基序,即并苯,并五苯和红荧烯,可能导致合成石墨烯质量的显着差异。当将花冠烯用作前体时,可以在低至550℃的生长温度下获得具有足够品质的单层石墨烯薄片。对于在1000°C下获得的石墨烯片材,通过对由大面积组成的背栅场效应晶体管(FET)进行的传输测量,在室温下裸SiO2 / Si上的载流子迁移率高达〜5300 cm2 / V·s通道长度(约30微米)。潜在的生长机理主要涉及脱氢多环芳烃的表面介导成核过程,而不是前体分解的小碳物种的析出或沉淀过程。第二,基于我们提出的生长机理,从另一多环芳烃获得了高质量的石墨烯片,即三亚苯基。由于三亚苯基的熔点低,因此在生长室外部用磁铁固定的镍箔被用作隔热层,以避免三亚苯基的任何不希望的升华。此外,在转移过程中,选择聚(双酚A碳酸酯)作为支撑层,而不是常用的聚(甲基丙烯酸甲酯,PMMA),以大规模获得清洁的石墨烯表面。第三,获得最佳质量的石墨烯从冠冕烯前体衍生的片材,发现OTMS-SAM改性的SiO2 / Si衬底可以一致地提高大面积石墨烯FET的性能。就提高的载流子迁移率(高达10,700 +/- 300 cm2 / s),载流子的平均自由程长,几乎消失的磁滞行为以及显着较低的固有掺杂水平而言,改善的传输性能主要归因于强抑制作用界面电荷杂质散射和远处界面声子(RIP)散射,偶极子吸附物的吸附较少,以及在石墨烯和电介质界面处的电荷转移减弱。已经通过GFET的Dirac点位置,G峰位置的拉曼光谱映射以及表面电势分布通过GFET的数量估算和证实了OTMS改性和裸SiO2 / Si上石墨烯的固有掺杂水平(费米能)。开尔文探针力显微镜(KPFM)。最后,我们提出了LPCVD合成(热壁反应器),分别通过使用铜箔封壳和铜管来获得单层和多层h-BN超薄膜。与石墨烯成核岛的六边形不同,h-BN开始以三角形/不对称菱形生长,这可能是由于受到能量更有利的氮原子封端的缘故。随着生长时间的延长,h-BN核/岛在平面内延伸并彼此融合,从而形成覆盖Cu表面的完整层。大面积(〜cm2)的多层h-BN超薄膜已成功转移到SiO2 / Si衬底上,并通过XPS,拉曼光谱和AFM进行了表征。利用合成的h-BN超薄膜,可以设想许多有趣的研究方面,这些方面必将带来重要的应用,例如,用于光电应用的UV发光薄膜以及用于石墨烯电子应用的栅极介电层/衬底。

著录项

  • 作者

    Wan, Xi.;

  • 作者单位

    The Chinese University of Hong Kong (Hong Kong).;

  • 授予单位 The Chinese University of Hong Kong (Hong Kong).;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2013
  • 页码 210 p.
  • 总页数 210
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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