【24h】

Nano structure formation by gas cluster ion beam irradiations at oblique incidence

机译:倾斜入射时气体簇离子束辐照形成纳米结构

获取原文
获取原文并翻译 | 示例

摘要

Nano structure formations on Au surfaces by 20 keV Ar gas cluster ion beam (GCIB) irradiation at an oWique incidence were studied. When the incident angle was close to 0° from the surface normal of Au targets, the Au surface was smoothed due to the lateral sputtering effects and there were no structure formations on the surfaces. However, ripples were formed on Au surfaces at incident angle of 60° without sample rotation. When the Au samples were irradiated with Ar-GCIB at 60° with sample rotation, cone like structures with 50nm in diameters were fabricated and the surface roughness had a maximum value. However, the surface roughness suddenly decreased over incident angle of 60°. Even though the surface roughness was the same in the cases with and without sample rotations at 85° incidence, ripple structures were formed parallel to the incoming GCIB directions when there was no rotation. The incident angle dependence of the sputtering depth decreased following cos8 dependence. Very efficient surface smoothing without removing materials were realized with oblique incidence.
机译:研究了以20keV Ar气体团簇离子束(GCIB)的低入射辐射在Au表面形成的纳米结构。当与Au靶的表面法线的入射角接近0°时,Au表面由于横向溅射效应而变得光滑,并且在表面上没有结构形成。然而,在没有样品旋转的情况下,以60°的入射角在Au表面上形成了波纹。当样品旋转时,以60°的Ar-GCIB照射Au样品时,制造出直径为50nm的锥形结构,并且表面粗糙度具有最大值。但是,表面粗糙度在入射角为60°时突然降低。即使在有和没有以85°入射角旋转样品的情况下,表面粗糙度相同,但是在不旋转的情况下,会形成平行于入射GCIB方向的波纹结构。溅射深度的入射角依赖性随着cos8依赖性而降低。斜入射使非常有效的表面平滑而不去除材料。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号