首页> 外文会议>Spectroscopic Characterization Techniques for Semiconductor Technology IV >Photoluminescence from pseudomorphically strained Si/Si1-xGex multiple quantum wells grown on silicon
【24h】

Photoluminescence from pseudomorphically strained Si/Si1-xGex multiple quantum wells grown on silicon

机译:硅上生长的拟晶应变Si / Si1-xGex多量子阱的光致发光

获取原文
获取原文并翻译 | 示例

摘要

Abstract: We have grown Si/Si$-1$MIN@x$/Ge$-x$/ multiple quantum wells (x $APEQ 8%) lattice-matched to silicon with well thicknesses between 3 and 20 nm using UHV-CVD. The sample parameters were obtained accurately with high-resolution x-ray diffraction (rocking curves) and transmission electron microscopy. From an analysis of the band-edge related photoluminescence energies we find a blue-shift due to confinement for thin wells. !26
机译:摘要:我们已经使用UHV-CVD生长了Si / Si $ -1 $ MIN @ x $ / Ge $ -x $ /多量子阱(x $ APEQ 8%),晶格匹配到硅厚度为3至20 nm的阱。样品参数是通过高分辨率X射线衍射(摇摆曲线)和透射电子显微镜准确获得的。通过对与带边缘相关的光致发光能量的分析,我们发现由于限制了薄孔的发生,蓝移。 !26

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号