首页> 外文会议>Proceedings of the Twenty-Third International Symposium on Compound Semiconductors held in St Petersburg, Russia, 23-27 September 1996 >Subband electron mobility in selectively delta -doped gaAs/GaAlAs heterostructures with high carrier density
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Subband electron mobility in selectively delta -doped gaAs/GaAlAs heterostructures with high carrier density

机译:高载流子密度选择性掺杂gaAs / GaAlAs异质结构中的子带电子迁移率

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摘要

We synthesised and investigated new high-carrier-density GaAs/GaAlAs heterostructures with combined doping, that is with delta-doping by SI of GaAs and uniform doping by Si of GaAlAs layers. The Hall effect and magnetoresistance were investigated for the structures with distances L delta between heterojunction and delta-alyer from 200A to 1200A. The enhanced 2D electron concentration achieved was 1.1~*10~(-13) cm~(-2) in six filled subbands for the sample with L delta chemical bounds A. Electron mobilities and concentrations in each 2D subband have been extracted from the magnetoresistance and Hall effect data. The electron mobility due to the scattering from ionized impurities has been calculated in the case when several subband are occupied.
机译:我们合成并研究了结合掺杂的高载流子密度GaAs / GaAlAs异质结构,即通过GaAs的SIδ掺杂和GaAlAs层的Si均匀掺杂。研究了在200A至1200A异质结和三角洲之间的距离L delta的结构的霍尔效应和磁阻。对于具有Lδ化学界A的样品,六个填充子带中实现的增强2D电子浓度为1.1〜* 10〜(-13)cm〜(-2)。已从磁阻中提取了每个2D子带中的电子迁移率和浓度和霍尔效应数据。在几个子带被占据的情况下,已经计算出由于离子杂质的散射而引起的电子迁移率。

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