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Dual-illumination NIR system for wafer level defect inspection

机译:双照明近红外系统,用于晶圆级缺陷检查

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CdZnTe is a high efficiency, room temperature radiation detection material that has attracted great interesting in medical and security applications. CZT crystals can be grown by various methods. Particularly, CZT grown with the Transfer Heater Method (THM) method have been shown to have fewer defects and greater material uniformity. In this work, we developed a proof-of-concept dual lighting NIR imaging system that can be implemented to quickly and nondestructively screen CZT boule and wafers during the manufacturing process. The system works by imaging the defects inside CZT at a shallow depth of focus, taking a stack of images step by step at different depths through the sample. The images are then processed with in-house software, which can locate the defects at different depths, construct the 3D mapping of the defects, and provide statistical defect information. This can help with screening materials for use in detector manufacturing at an early stage, which can significantly reduce the downstream cost of detector fabrication. This inspection method can also be used to help the manufacturer understand the cause of the defect formation and ultimately improve the manufacturing process.
机译:CdZnTe是一种高效的室温辐射检测材料,在医疗和安全应用中引起了极大的兴趣。 CZT晶体可以通过各种方法生长。特别地,已经显示了通过转移加热器法(THM)方法生长的CZT具有更少的缺陷和更大的材料均匀性。在这项工作中,我们开发了一种概念验证的双照明NIR成像系统,该系统可用于在制造过程中快速无损地筛分CZT晶锭和晶圆。该系统的工作原理是在浅焦点处对CZT内部的缺陷进行成像,并在穿过样品的不同深度处逐步拍摄一堆图像。然后使用内部软件处理图像,该软件可以将缺陷定位在不同的深度,构造缺陷的3D映射,并提供统计缺陷信息。这可以帮助筛选早期用于检测器制造的材料,从而可以大大降低检测器制造的下游成本。此检查方法还可用于帮助制造商了解缺陷形成的原因并最终改善制造过程。

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