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Stacking Fault and Growth Direction of β-SiC Whisker Synthesized by Carbothermal Reduction

机译:碳热还原法合成β-SiC晶须的堆垛层错及生长方向

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The whisker morphology and whisker content in the β-SiC powder synthesized from SiO_2 and carbon black were more closely related to SiO partial pressure than reaction temperature. By controlling the SiO partial pressure through the change of stacking manner and the mixing of starting powder, deflected whiskers were successfully synthesized. The whisker deflection deeply depended on the inserted direction of stacking fault. The deflection angles of the whiskers synthesized from the mixed and the stacked powder were 55° and 109°, respectively. The deflected whisker with 55° was formed by the existence of stacking fault planes not perpendicular to the growth direction of the whisker. The deflected whisker with 109° had three different directions of stacking faults of {111} planes including twin faults.
机译:由SiO_2和炭黑合成的β-SiC粉末的晶须形貌和晶须含量与反应温度相比与SiO分压关系密切。通过改变堆积方式和原料粉末的混合来控制SiO的分压,成功地合成了偏斜的晶须。晶须挠度在很大程度上取决于插入的堆垛层错方向。由混合粉末和堆积粉末合成的晶须的偏转角分别为55°和109°。 55°偏转的晶须是由于存在不垂直于晶须生长方向的堆叠断层而形成的。偏角为109°的晶须具有{111}面的三个不同方向的堆叠断层,包括双断层。

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