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首页> 外文期刊>Key Engineering Materials >Stacking Fault and Growth Direction of beta-SiC Whisker Synthesized by Carbothermal Reduction
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Stacking Fault and Growth Direction of beta-SiC Whisker Synthesized by Carbothermal Reduction

机译:碳热还原法合成β-SiC晶须的堆垛层错及生长方向

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摘要

The whisker morphology and whisker content in the beta-SiC powder synthesized from SiO2 and carbon black were more closely related to SiO partial pressure than reaction temperature. By controlling the SiO partial pressure through the change of stacking manner and the mixing of starting powder, deflected whiskers were successfully synthesized. The whisker deflection deeply Jepended on the inserted direction of stacking fault. The defiection angles of the whiskers synthesized from the mixed and the stacked powder were 55 deg. and 109 deg.', respectively The deflected whisker with 55` deg. was formed by the existence of stacking fault planes not perpendicular to the growth direction of the whisker. The deflected whisker with 109 deg. had three different directions ofstacking faults of { 1 1 1 } planes including twin faults.
机译:由SiO2和炭黑合成的β-SiC粉末的晶须形貌和晶须含量与反应温度相比与SiO分压关系更密切。通过改变堆积方式和原料粉末的混合来控制SiO的分压,成功地合成了偏斜的晶须。晶须偏转在堆叠故障的插入方向上深深地弯曲。由混合粉末和堆积粉末合成的晶须的偏转角为55度。分别为109度和109度。它是由不垂直于晶须生长方向的堆叠断层平面形成的。偏角为109度。 {1 1 1}平面具有三个不同的堆叠断层方向,包括双断层。

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