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Selective growth of conjugated polymer thin film with nano scale controlling by chemical vapor depositions (CVD) toward 'Nanonics'

机译:通过化学气相沉积(CVD)向'Nanonics'纳米控制的共轭聚合物薄膜的选择性生长

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We present a novel polymer-chain-controlling and selective growth technique to make high-index-contrast (HIC) waveguides and photonic crystals. In the present work, poly-azomethine (poly-AM) films that are conjugated polymer were grown on substrates with surface treatment by chemical vapor deposition (CVD) using p-phenylenediamine (PPDA) and terephthalaldehyde (TPA) as reactive source monomers. For polymer chain controlling, poly-AM films were grown by CVD on SiO film, which was obliquely evaporated on a substrate tilted along the y-axis. The chains on the SiO film were found to be aligned along the y-axis. For selective growth, on a glass substrate surface, where a hydrophobic treatment was applied using hexamethyl-disilazane (HMDS), a hydrophilic SiO thin film was deposited through a metal mask by the vacuum evaporation to form a hydrophilic/hydrophobic pattern. The poly-AM thin film was found to be selectively grown on the SiO region, that is, on the hydrophilic region, without growth on the hydrophobic region. These results demonstrate a potentiality of the proposed technique to provide a wide range of three-dimensional fine structures.
机译:我们提出了一种新型的聚合物链控制和选择性生长技术,以制造高折射率对比(HIC)波导和光子晶体。在本工作中,使用对苯二胺(PPDA)和对苯二甲醛(TPA)作为反应源单体,通过化学气相沉积(CVD)对表面进行了表面处理,从而在基板上生长了共轭聚合物的聚偶氮甲碱(poly-AM)膜。为了控制聚合物链,通过CVD在SiO膜上生长poly-AM膜,然后将其倾斜蒸发在沿y轴倾斜的基板上。发现SiO膜上的链沿y轴排列。为了选择性生长,在使用六甲基二硅氮烷(HMDS)进行疏水处理的玻璃基板表面上,通过真空蒸发通过金属掩模沉积亲水性SiO薄膜,以形成亲水/疏水图案。发现聚AM薄膜在SiO区域上,即在亲水区域上选择性地生长,而在疏水区域上没有生长。这些结果证明了所提出的技术提供广泛的三维精细结构的潜力。

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