AUTOMATIC VALVE CONTROL SYSTEM IN PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM AND CHEMICAL VAPOR DEPOSITION SYSTEM FOR DEPOSITION OF NANO-SCALE MULTILAYER FILM

摘要

PURPOSE: A plasma chemical vapor deposition equipment for manufacturing nano-scale multilayer film having ultra-high hardness and multiple functions using plasma chemical deposition and chemical vapor deposition is provided, and an automatic valve control system of the chemical vapor deposition equipment is provided. CONSTITUTION: In a system for manufacturing a multilayer thin film using plasma chemical vapor deposition and chemical vapor deposition, the automatic valve control system(20) of plasma chemical vapor deposition equipment and chemical vapor deposition equipment for manufacturing nano-scale multilayer film comprises a chamber(10) in which at least two or more components are formed into a multilayer thin film by plasma chemical deposition and chemical vapor deposition; at least two source supply parts(25,26) for supplying a reaction material including components composing any one layer in the multilayer thin film; at least two paths(22,23) the middle part of which is connected to the respective source supply parts, one end of which is connected to the chamber, and the other end of which is connected to bypass pipe for controlling flux; a vacuum pump connected to the bypass pipe; and at least four valves(27 to 30) opened and closed with being installed at both sides of the respective paths centering around a connection region of the respective source supply parts.