Nanomechanical and Electrochemical Properties of Diamond-Like Carbon (DLC) Films Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) Technique

摘要

Diamond-like carbon (DLC) films was deposited successfully on stainless steel substrateswith Si/SiC intermediate layers by combining plasma enhanced unbalanced magnetronsputtering physical vapor deposition (PEUMS-PVD) and microwave electron cyclotron resonanceplasma enhanced chemical vapor deposition (MW-ECR PECVD) techniques. The effect of silicondopant on the structure, morphology, nanomechanical properties and electrochemical behaviorof DLC films were investigated by Raman spectroscopy, nano-indentation, atomic forcemicroscopy (AFM) and potentiodynamic method and electrochemical impedance spectroscopy(EIS). It showed that the incorporated silicon atoms substituted sp^2-bonded carbon atoms in thering structures, promoting the formation of sp^3-bonds. The structural transition from C-C to C-Sibonds resulted in the relaxation of the residual stress, leading to the decrease in fihns hardness.The DLC films with Si/SiC intermediate layers led to significant improvement in the corrosionresistance of the stainless steel substrate due to effective isolation and good chemical inertness ofthe DLC films.