AUTOMATIC VALVE CONTROL SYSTEM IN PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM AND CHEMICAL VAPOR DEPOSITION SYSTEM FOR DEPOSITION OF NANO-SCALE MULTILAYER FILM

摘要

An automatic valve control system in PCVD system or CVD system for deposition of nano-scale multilayer film having nano-scale ultra-high hardness and multifunction is provided. The automatic valve control system includes a chamber in which a multilayer thin-film can be formed of at least two components by using PCVD method or CVD method, at least two source supplies supplying a reaction material, at least two paths each whose middle portion is connected to each source supply, whose one end is connected to the chamber, and whose other end is connected to a bypass tube, a vacuum pump connected to the bypass tube, and at least four valves installed in either side of each path around each connection portion in each source supply, which is opened or closed.