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Selective growth of conjugated polymer thin film with nano scale controlling by chemical vapor depositions (CVD) toward 'Nanonics'

机译:通过化学气相沉积(CVD)向“纳米型”的纳米尺度控制共轭聚合物薄膜的选择性生长

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We present a novel polymer-chain-controlling and selective growth technique to make high-index-contrast (HIC) waveguides and photonic crystals. In the present work, poly-azomethine (poly-AM) films that are conjugated polymer were grown on substrates with surface treatment by chemical vapor deposition (CVD) using p-phenylenediamine (PPDA) and terephthalaldehyde (TPA) as reactive source monomers. For polymer chain controlling, poly-AM films were grown by CVD on SiO film, which was obliquely evaporated on a substrate tilted along the y-axis. The chains on the SiO film were found to be aligned along the y-axis. For selective growth, on a glass substrate surface, where a hydrophobic treatment was applied using hexamethyl-disilazane (HMDS), a hydrophilic SiO thin film was deposited through a metal mask by the vacuum evaporation to form a hydrophilic/hydrophobic pattern. The poly-AM thin film was found to be selectively grown on the SiO region, that is, on the hydrophilic region, without growth on the hydrophobic region. These results demonstrate a potentiality of the proposed technique to provide a wide range of three-dimensional fine structures.
机译:我们提出了一种新型聚合物链控制和选择性生长技术,以制备高指数对比(HIC)波导和光子晶体。在本作的工作中,通过使用对苯二胺(PPDA)和对苯二甲醛(TPA)的化学气相沉积(CVD)作为反应源单体,在具有表面处理的缀合聚合物的聚 - 氮杂甲胺(Poly-AM)薄膜上生长在具有表面处理的底物上。对于聚合物链控制,通过CVD在SiO膜上生长多AM膜,其在沿Y轴倾斜的基板上倾斜地蒸发。发现SiO膜上的链沿Y轴对齐。为了选择性生长,在使用六甲基 - 二硅烷(HMDS)施加疏水处理的玻璃基板表面上,通过真空蒸发通过金属掩模沉积亲水性SiO薄膜,形成亲水/疏水图案。发现聚磷薄膜在SiO区域上选择性地生长,即在亲水区上,没有疏水区域的生长。这些结果表明了所提出的技术提供广泛的三维细结构的潜力。

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