Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology (FEP), Germany;
Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology (FEP), Germany;
Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology (FEP), Germany;
Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology (FEP), Germany;
Sputter deposition; Energy Harvesting; Sc-doping; AlScN;
机译:压电AlN和AlScN薄膜的磁控溅射及其在能量收集应用中的用途
机译:用于超声和能量收集应用的应力控制压电AlN和AlScN膜的溅射沉积
机译:钪含量对反应脉冲磁控溅射沉积的Alscn膜结构和压电性能的影响
机译:基于压电ALN和ALSCN薄膜沉积的能量收集,高速溅射沉积
机译:在高温“智能”摩擦应用中,在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
机译:用柔性压电能量收集微生物喷涂沉积的ZnO纳米棒膜的合成
机译:rf反应磁控溅射在低温下沉积在Si上的压电Aln薄膜的表征