首页> 外文会议>Micro- and Nanotechnology Sensors, Systems, and Applications IX >Energy harvesting based on piezoelectric A1N and AlScN thin films deposited by high rate sputtering
【24h】

Energy harvesting based on piezoelectric A1N and AlScN thin films deposited by high rate sputtering

机译:基于高速率溅射沉积的压电AlN和AlScN薄膜的能量收集

获取原文
获取原文并翻译 | 示例

摘要

Aluminum nitride (A1N) is a piezoelectric material often used as thin film in SAW/BAW devices. Furthermore, there is an increasing interest in its use for energy harvesting applications. Despite it has a relatively low piezoelectric coefficient, it is a suitable choice for energy harvesting applications and due to its low dielectric constant and good mechanical properties. In addition, it is a lead-free material. The films were deposited by reactive pulsed magnetron sputtering using the Double Ring Magnetron DRM 400. This sputter source together with suitable powering and process control allows depositing piezoelectric A1N very homogeneously on 8" substrates with deposition rates of up to 200 nm/min. With the developed technology, film thicknesses of several ten microns are technically and economically feasible. Moreover, by adjusting process parameters accordingly, it is possible to tune properties, like film stress, to application specific requirements. Additionally, it is known that the doping of A1N with Scandium results in a significantly increased piezoelectric coefficient. The influence of process parameters and Sc concentration on film properties were determined by piezometer, pulse echo, SEM, XRD, EDS and nanoindentation measurements. Energy harvesting measurements were done using an electromechanical shaker system for the excitation of defined vibrations and a laservibrometer for determination of the displacement of the samples. The generated power was measured as function of electric load at resonance. An rms power of up to 140uW using A1N films and of 350uW using AlScN films was generated on Si test pieces of 8x80mm~2. Furthermore, energy harvesting measurements using manually bended steel strips of 75x25mm2 coated with AlScN were carried out as well. When using only a single actuation, energy of up to 8uJ could be measured. By letting the system vibrate freely, the damped vibration at resonance 50Hz resulted in a measured energy of 420uJ.
机译:氮化铝(AlN)是一种压电材料,通常在SAW / BAW器件中用作薄膜。此外,人们越来越将其用于能量收集应用。尽管它具有相对较低的压电系数,但由于其介电常数低和良好的机械性能,因此是能量收集应用的合适选择。另外,它是无铅材料。薄膜是使用双环磁控管DRM 400通过反应性脉冲磁控溅射法沉积的。该溅射源以及适当的功率和工艺控制可将压电AlN非常均匀地沉积在8英寸的基板上,沉积速率最高为200 nm / min。发达的技术,在技术上和经济上都可以达到几十微米的膜厚,此外,通过相应地调整工艺参数,可以将膜应力等特性调整到特定的应用要求。 dium显着提高了压电系数,通过压强计,脉冲回波,SEM,XRD,EDS和纳米压痕测量确定了工艺参数和Sc浓度对薄膜性能的影响,并使用机电振动系统进行能量收集测量确定的振动和激光测振仪的检测消除样品的位移。测量所产生的功率作为谐振时电负载的函数。在8x80mm〜2的Si试件上,使用AlN薄膜时的均方根功率高达140uW,使用AlScN薄膜时的均方根功率为350uW。此外,还使用覆盖有AlScN的75x25mm2手动弯曲钢带进行了能量收集测量。当仅使用单个致动时,可以测量高达8uJ的能量。通过使系统自由振动,共振频率为50Hz时的阻尼振动导致测得的能量为420uJ。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号